SCHEMBL10312335

SCHEMBL10312335

C[Si](C)(C)CCCNS(C)(=O)=O

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.42
ALDH1A1 P00352 4/20 0.40
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA12 O43570 1/20 0.36
CA7 P43166 1/20 0.36
CA14 Q9ULX7 1/20 0.36
PTGES O14684 1/20 0.34
GRIA1 P42261 3/20 0.33
KDM4D Q6B0I6 1/20 0.33
MAPT P10636 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
ALOX15 P16050 1/20 0.32
NPY5R Q15761 3/20 0.31
PPARA Q07869 2/20 0.31
EPHX2 P34913 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28219991 0.85 POLB (0.36) POLBALDH1A1CA1CA2PTGES
SCHEMBL26455271 0.82 POLB (0.40) POLBALDH1A1CA1CA2CA12
SCHEMBL26454659 0.82 POLB (0.40) POLBALDH1A1CA1CA2CA12
SCHEMBL26454404 0.79 POLB (0.41) POLBALDH1A1CA1CA2CA12
SCHEMBL3797797 0.79 POLB (0.41) POLBALDH1A1CA1CA2CA12
SCHEMBL12090531 0.79 POLB (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL14739265 0.76 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL14739816 0.76 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL14739515 0.76 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL14739086 0.76 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828879-B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM STS, SI, MUS81 POLB 1418/4885ALDH1A1 2958/4885CA1 35/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.