⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18544143 | 1.00 | — | — | |
| SCHEMBL23825460 | 0.79 | — | — | |
| SCHEMBL23825462 | 0.79 | — | — | |
| SCHEMBL23825499 | 0.79 | — | — | |
| SCHEMBL23825500 | 0.79 | — | — | |
| SCHEMBL3758675 | 0.79 | TSHR (0.34) | — | |
| SCHEMBL3758685 | 0.79 | TSHR (0.34) | — | |
| SCHEMBL3758681 | 0.79 | TSHR (0.34) | — | |
| SCHEMBL23825481 | 0.74 | — | — | |
| SCHEMBL23825487 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3178808-B1 | ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM FORMATION METHOD AND ALCOHOL COMPOUND | ADEKA CORP (JP) | 2024-11-06 | — | — | EP | disclosed |
| EP-3882234-B1 | COBALT COMPLEX, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING COBALT-CONTAINING THIN FILM | TOSOH CORP (JP) | 2024-05-08 | — | — | EP | disclosed |
| US-11753429-B2 | Cobalt complex, method for manufacturing same, and method for manufacturing cobalt-containing thin film | TOSOH CORPORATION (JP) | 2023-09-12 | — | — | US | disclosed |
| CN-112839924-B | Cobalt complex, method for producing same, and method for producing cobalt-containing thin film | 东曹株式会社 | 2023-07-07 | — | — | CN | disclosed |
| US-20220017553-A1 | COBALT COMPLEX, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING COBALT-CONTAINING THIN FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-01-20 | — | — | US | disclosed |
| EP-3882234-A1 | COBALT COMPLEX, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING COBALT-CONTAINING THIN FILM | Tosoh Corporation (JP) | 2021-09-22 | — | — | EP | disclosed |
| CN-112839924-A | Cobalt complex, method for producing same, and method for producing cobalt-containing thin film | 东曹株式会社 | 2021-05-25 | — | — | CN | disclosed |
| EP-3135664-B1 | ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND | ADEKA CORP (JP) | 2019-10-23 | — | — | EP | disclosed |
| US-10351584-B2 | Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound | ADEKA CORPORATION (JP) | 2019-07-16 | — | — | US | disclosed |
| US-20180282358-A1 | ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM FORMATION METHOD, AND ALCOHOL COMPOUND | ADEKA CORPORATION (JP) | 2018-10-04 | — | — | US | disclosed |
| US-9234273-B2 | Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same | MICRON TECHNOLOGY, INC. (US) | 2016-01-12 | — | — | US | disclosed |
| EP-1907354-B1 | UNSYMMETRICAL LIGAND SOURCES, REDUCED SYMMETRY METAL-CONTAINING COMPOUNDS, AND SYSTEMS AND METHODS INCLUDING SAME | MICRON TECHNOLOGY INC (US) | 2012-01-25 | — | — | EP | disclosed |
| US-20110071316-A1 | Unsymmetrical Ligand Sources, Reduced Symmetry Metal-Containing Compounds, and Systems and Methods Including Same | MICRON TECHNOLOGY, INC. (US) | 2011-03-24 | — | — | US | disclosed |
| US-7858523-B2 | Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same | MICRON TECHNOLOGY, INC. (US) | 2010-12-28 | — | — | US | disclosed |
| US-20090275199-A1 | UNSYMMETRICAL LIGAND SOURCES, REDUCED SYMMETRY METAL-CONTAINING COMPOUNDS, AND SYSTEMS AND METHODS INCLUDING SAME | MICRON TECHNOLOGY, INC. (US) | 2009-11-05 | — | — | US | disclosed |
| US-7572731-B2 | Group 2a, yttrium or lanthanide complexes of a beta-diketiminate ligand; for example, Strontium bis(N-isopropyl-(4-tert-butylimino)-2-penten-2-aminato); for chemical vapor deposition in semiconductor manufacture; higher vapor pressure, lower melting point, and lower sublimation point | MICRON TECHNOLOGY, INC. (US) | 2009-08-11 | — | — | US | disclosed |
| US-20080214001-A9 | Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same | MICRON TECHNOLOGY, INC. (US) | 2008-09-04 | — | — | US | disclosed |
| EP-1907354-A2 | UNSYMMETRICAL LIGAND SOURCES, REDUCED SYMMETRY METAL-CONTAINING COMPOUNDS, AND SYSTEMS AND METHODS INCLUDING SAME | MICRON TECHNOLOGY, INC. (US) | 2008-04-09 | — | — | EP | disclosed |
| WO-2007002674-A2 | UNSYMMETRICAL LIGAND SOURCES, REDUCED SYMMETRY METAL-CONTAINING COMPOUNDS, AND SYSTEMS AND METHODS INCLUDING SAME | MICRON TECHNOLOGY, INC. (US) | 2007-01-04 | — | — | WO | disclosed |
| US-20060292873-A1 | Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same | MICRON TECHNOLOGY, INC. (US) | 2006-12-28 | — | — | US | disclosed |