⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30227151 | 0.95 | ALDH1A1 (0.50) | — | |
| Boric Acid SCHEMBL25281446 | 0.88 | ALDH1A1 (0.44) | — | |
| SCHEMBL16671676 | 0.82 | — | — | |
| SCHEMBL4318488 | 0.82 | ALDH1A1 (0.47) | — | |
| SCHEMBL102085 | 0.82 | — | — | |
| SCHEMBL9246782 | 0.82 | ALDH1A1 (0.39) | — | |
| SCHEMBL18407516 | 0.79 | ALDH1A1 (0.44) | — | |
| SCHEMBL3765307 | 0.76 | — | — | |
| SCHEMBL13674378 | 0.76 | — | — | |
| SCHEMBL12760976 | 0.76 | ALDH1A1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3347 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12617892-B2 | Application of the ring-opening of uretdiones at low temperature and ambient atmosphere | BASF SE (DE) | 2026-05-05 | — | — | US | claimed |
| CN-119736616-A | Washing-free chromium-free antioxidant liquid for lithium ion battery copper foil, and preparation method and use method thereof | 哈尔滨工业大学 | 2025-04-01 | — | — | CN | claimed |
| CN-115519276-B | Adhesive for soldering paste, and preparation method and application thereof | 上海华庆焊材技术股份有限公司 | 2024-08-09 | — | — | CN | claimed |
| EP-2954301-B1 | CYTOLOGICAL STAINING COMPOSITIONS AND USES THEREOF | TRIPATH IMAGING INC (US) | 2024-06-12 | — | — | EP | claimed |
| CN-117736377-A | Dual-image orthogonal storage material, and preparation method and application thereof | 华中科技大学 | 2024-03-22 | — | — | CN | claimed |
| CN-117417795-A | Microwave component chip cleaning agent based on double solvents and preparation method thereof | 华阳新兴科技（天津）集团有限公司 | 2024-01-19 | — | — | CN | claimed |
| EP-4065628-B1 | EPOXY-DERIVED COVALENT ADAPTABLE NETWORKS AND METHODS OF THEIR PRODUCTION | UNIV GENT (BE) | 2023-10-25 | — | — | EP | claimed |
| US-20230323013-A1 | APPLICATION OF THE RING-OPENING OF URETDIONES AT LOW TEMPERATURE AND AMBIENT ATMOSPHERE | BASF SE (DE) | 2023-10-12 | — | — | US | claimed |
| CN-116706091-A | Catalytic layer with amplitude modulation-like decomposition characteristics and preparation method thereof | 武汉理工氢电科技有限公司 | 2023-09-05 | — | — | CN | claimed |
| CN-114957635-B | Bio-based polyether ester-co-polylactic acid and preparation method thereof | 北京化工大学 | 2023-07-25 | — | — | CN | claimed |
| WO-1992022614-A1 | PENETRANTS FOR AQUEOUS INK JET INKS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-12-23 | — | — | WO | claimed |
| EP-0507727-A2 | Glass coating with improved adhesion and weather resistance | CIBA-GEIGY AG (CH) | 1992-10-07 | — | — | EP | claimed |
| US-5141556-A | Branched diols or hexene-1,2-diols along with a pigment or dye; rapid drying; storage stability; quality; thermal printers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-08-25 | — | — | US | claimed |
| US-4863822-A | Electrophotographic photoconductor comprising charge generating and transport layers containing adjuvants | RICOH COMPANY LTD. (JP) | 1989-09-05 | — | — | US | claimed |
| EP-0069195-B1 | STABILIZED ETHYLENE/CHLOROTRIFLUOROETHYLENE COPOLYMER COMPOSITION | Ausimont, U.S.A., Inc. (US) | 1988-08-24 | — | — | EP | claimed |
| EP-0267707-A1 | A novel disinfectant composition | KAM Scientific Inc. (a British Columbia Corporation) (CA) | 1988-05-18 | — | — | EP | claimed |
| US-4539354-A | PHOSPHITE DERIVATIVE OF A PHENOL, A GROUP II METAL CARBOXYLATE ANDAN ESTER OF A POLYOL | ALLIED CORPORATION (US) | 1985-09-03 | — | — | US | claimed |
| EP-0069195-A2 | Stabilized ethylene/chlorotrifluoroethylene copolymer composition | Ausimont, U.S.A., Inc. (US) | 1983-01-12 | — | — | EP | claimed |
| US-4262936-A | FOR PRESSURE SENSITIVE RECORDING | FUJI PHOTO FILM CO., LTD. (JP) | 1981-04-21 | — | — | US | claimed |
| US-4259510-A | TREATING A TRIFLUOROMETHYLHALOBENZENE WITH A HYDROXIDE FOLLOWED BY ETHERIFICATION WITH A HALONITROBENZENE | ROHM AND HAAS COMPANY | 1981-03-31 | — | — | US | claimed |