Phosphine

Phosphine

SCHEMBL380144

P.[As-3].[Ga+3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphine SCHEMBL379957 0.87
Phosphine SCHEMBL8229578 0.87
SCHEMBL10410008 0.82
SCHEMBL11203222 0.82
SCHEMBL10802613 0.82
SCHEMBL19346 0.82
Arsenic SCHEMBL9551940 0.67
SCHEMBL17982598 0.67
Zinc Ion SCHEMBL2242139 0.67
SCHEMBL4353076 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116905090-B Growth method of gradient phosphorus component gallium arsenide material 苏州焜原光电有限公司 2023-12-01 CN claimed
CN-116905090-A Growth method of gradient phosphorus component gallium arsenide material 苏州焜原光电有限公司 2023-10-20 CN claimed
CN-211555874-U Double-color LED 广西东科视创光电科技有限公司 2020-09-22 CN claimed
CN-208739137-U A kind of network transmission communication adapter 厦门冠科科技有限公司 2019-04-12 CN claimed
US-20130098289-A1 METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR ALTA DEVICES, INC. (US) 2013-04-25 US claimed
US-8008174-B2 Continuous feed chemical vapor deposition ALTA DEVICES, INC. (US) 2011-08-30 US claimed
EP-2351069-A2 CONTINUOUS FEED CHEMICAL VAPOR DEPOSITION Alta Devices, Inc. (US) 2011-08-03 EP claimed
EP-2281300-A2 METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR Alta Devices, Inc. (US) 2011-02-09 EP claimed
US-20100120233-A1 Continuous Feed Chemical Vapor Deposition ALTA DEVICES, INC. (US) 2010-05-13 US claimed
WO-2010042927-A2 CONTINUOUS FEED CHEMICAL VAPOR DEPOSITION ALTA DEVICES, INC. (US) 2010-04-15 WO claimed
US-20090325367-A1 METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR ALTA DEVICES, INC. (US) 2009-12-31 US claimed
WO-2009155119-A2 METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR ALTA DEVICES, INC. (US) 2009-12-23 WO claimed
JP-62272530-A None JP disclosed
JP-5308152-A None JP disclosed
CN-118053900-A Group III nitride transistor device 英飞凌科技奥地利有限公司 2024-05-17 CN disclosed
CN-117270249-A Method for manufacturing display device 凌巨科技股份有限公司 2023-12-22 CN disclosed
US-20090325367-A1 METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR ALTA DEVICES, INC. (US) 2009-12-31 US disclosed
WO-2009155119-A2 METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR ALTA DEVICES, INC. (US) 2009-12-23 WO disclosed
JP-H05308152-A LIGHT EMITTING ELEMENT EASTMAN KODAK JAPAN KK 1993-11-19 JP disclosed
JP-S62272530-A MASK FOR TRANSFERRING PHOTOELECTRON FUJITSU LTD 1987-11-26 JP disclosed