Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 8/20 | 0.80 |
| ▸ | ESR1 | P03372 | 6/20 | 0.80 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.47 |
| ▸ | CA3 | P07451 | 2/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.47 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | CA12 | O43570 | 1/20 | 0.47 |
| ▸ | GMNN | O75496 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 1/20 | 0.47 |
| ▸ | CA2 | P00918 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | TYR | P14679 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7530533 | 1.00 | ESR2 (0.80) | ESR2ESR1ALDH1A1ALOX15CA3 | |
| SCHEMBL9838333 | 0.92 | ESR2 (0.95) | ESR2ESR1ALDH1A1ALOX15CA3 | |
| SCHEMBL19428169 | 0.92 | ESR2 (0.70) | ESR2ESR1ALDH1A1ALOX15CA3 | |
| SCHEMBL30738223 | 0.90 | ESR1 (0.67) | ESR2ESR1CA3CA14MEN1 | |
| Propane SCHEMBL8058733 | 0.90 | ESR1 (0.67) | ESR2ESR1ALDH1A1ALOX15CA3 | |
| SCHEMBL8411084 | 0.89 | ESR2 (0.90) | ESR2ESR1ALDH1A1ALOX15CA3 | |
| SCHEMBL10515534 | 0.89 | ESR2 (0.65) | ESR2ESR1ALDH1A1ALOX15CA3 | |
| SCHEMBL120895 | 0.89 | ESR2 (1.00) | ESR2ESR1ALDH1A1ALOX15CA3 | |
| SCHEMBL870311 | 0.89 | ESR2 (0.90) | ESR2ESR1ALDH1A1ALOX15CA3 | |
| SCHEMBL7683232 | 0.88 | ESR2 (0.64) | ESR2ESR1ALDH1A1ALOX15CA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2721446-B1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN | FUJIFILM CORP (JP) | 2017-11-22 | — | — | EP | disclosed |
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9235116-B2 | Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9235116-B2 | Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20140342275-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-20140342275-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8883379-B2 | Resist-protective film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-11 | — | — | US | disclosed |
| US-8841059-B2 | Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-09-23 | — | — | US | disclosed |
| US-8841059-B2 | Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-09-23 | — | — | US | disclosed |
| EP-0343798-A1 | Preparation of aromatic compounds and derivatives thereof | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1989-11-29 | — | — | EP | disclosed |
| US-4786700-A | PREPARED FROM STYRENE TERMINATED TETRAKISPHENOLS, CIRCUIT BOARDS | ALLIED-SIGNAL, INC. (US) | 1988-11-22 | — | — | US | disclosed |
| WO-1988005059-A1 | THERMOSET POLYMERS OF STYRENE TERMINATED TETRAKIS PHENOLS | ALLIED CORPORATION (US) | 1988-07-14 | — | — | WO | disclosed |
| US-4728708-A | Thermoset polymers of styrene terminated tetrakis phenols | ALLIED CORPORATION (US) | 1988-03-01 | — | — | US | disclosed |
| US-4680298-A | Tricyclic anti-allergy and use as anti-inflammatory agents | SCHERING CORPORATION (US) | 1987-07-14 | — | — | US | disclosed |
| EP-0093320-B1 | PROCESS FOR THE EXTRACTION OF ONIUM SALTS FROM PROCESS AND WASTE WATERS | BAYER AG (DE) | 1987-06-16 | — | — | EP | disclosed |
| US-4487698-A | REMOVING QUATERNARY AMMONIUM AND PHOSPHONIM SALTS WITH PHENOLIC COMPOUNDS; PHASE TRANSFER | BAYER AKTIENGESELLSCHAFT (DE) | 1984-12-11 | — | — | US | disclosed |
| EP-0093320-A2 | Process for the extraction of onium salts from process and waste waters | BAYER AG (DE) | 1983-11-09 | — | — | EP | disclosed |
| US-4277600-A | Tetraphenolic compounds and polycarbonates containing the same | GENERAL ELECTRIC COMPANY (US) | 1981-07-07 | — | — | US | disclosed |
| US-4247484-A | Keto-diphenol compounds | GENERAL ELECTRIC COMPANY (US) | 1981-01-27 | — | — | US | disclosed |