Anthracene

Anthracene

SCHEMBL3829432

CNc1ccccc1C(=O)O.c1ccc2cc3ccccc3cc2c1

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.55
POLB P06746 1/20 0.55
ATM Q13315 1/20 0.55
CDC25B P30305 2/20 0.52
KMT2A Q03164 4/20 0.51
KDM4C Q9H3R0 1/20 0.51
FABP4 P15090 2/20 0.51
FABP3 P05413 1/20 0.51
FABP5 Q01469 1/20 0.51
TERT O14746 2/20 0.50
MAPT P10636 1/20 0.50
GFER P55789 1/20 0.50
NGLY1 Q96IV0 1/20 0.50
MEN1 O00255 3/20 0.49
CASP3 P42574 1/20 0.49
SENP8 Q96LD8 1/20 0.49
SENP7 Q9BQF6 1/20 0.49
SENP6 Q9GZR1 1/20 0.49
AKR1B10 O60218 2/20 0.49
AKR1B1 P15121 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
N-Methylanthranilic Acid SCHEMBL29381752 0.90 KDM4E (0.64) KDM4EPOLBATMKMT2AKDM4C
N-Methylanthranilic Acid SCHEMBL130356 0.90 KDM4E (0.64) KDM4EPOLBATMKMT2AKDM4C
N-Methylanthranilic Acid SCHEMBL9787433 0.88 KDM4E (0.62) KDM4EPOLBATMKMT2AKDM4C
N-Methylanthranilic Acid SCHEMBL9878983 0.88 KDM4E (0.62) KDM4EPOLBATMKMT2AKDM4C
N-Methylanthranilic Acid SCHEMBL10796607 0.88 KDM4E (0.62) KDM4EPOLBATMKMT2AKDM4C
N-Methylanthranilic Acid SCHEMBL8552208 0.88 KDM4E (0.62) KDM4EPOLBATMKMT2AKDM4C
N-Methylanthranilic Acid SCHEMBL28762522 0.83 KDM4E (0.56) KDM4EPOLBATMKMT2AKDM4C
SCHEMBL10796972 0.83 MAPT (0.66) KDM4EPOLBCDC25BKMT2AKDM4C
N-Methylanthranilic Acid SCHEMBL3044744 0.80 NR4A1 (0.59) KDM4EPOLBATMCDC25BKMT2A
Fenamic Acid SCHEMBL7265127 0.80 FABP4 (0.77) KDM4ECDC25BKMT2AFABP4FABP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7906004-B2 Method of forming oxide film by anodically oxidizing in an electrolyte solution MITSUBISHI CHEMICAL CORPORATION (JP) 2011-03-15 US disclosed
US-20090023001-A1 ELECTROLYTE SOLUTION AND METHOD OF FORMING OXIDE FILM USING THE SAME, STACK AND PROCESS OF PRODUCING THE SAME, AND METAL OXIDE FILM MITSUBISHI CHEMICAL CORPORATION (JP) 2009-01-22 US disclosed