Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 9/20 | 0.41 |
| ▸ | CA2 | P00918 | 9/20 | 0.41 |
| ▸ | CA9 | Q16790 | 8/20 | 0.41 |
| ▸ | CA12 | O43570 | 3/20 | 0.41 |
| ▸ | CA7 | P43166 | 3/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.41 |
| ▸ | CA3 | P07451 | 2/20 | 0.41 |
| ▸ | CA4 | P22748 | 2/20 | 0.41 |
| ▸ | CA6 | P23280 | 2/20 | 0.41 |
| ▸ | CA5A | P35218 | 2/20 | 0.41 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.41 |
| ▸ | PPARA | Q07869 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | RECQL | P46063 | 2/20 | 0.40 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.40 |
| ▸ | THRB | P10828 | 2/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3036006 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL7613209 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL3039875 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL4879826 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL10822147 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL7920142 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL179762 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL446394 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL444025 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 | |
| SCHEMBL3620268 | 1.00 | CA1 (0.41) | CA1CA2CA9CA12CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 357 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12637616-B2 | Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device | VERSUM MATERIALS US, LLC (US) | 2026-05-26 | — | — | US | claimed |
| EP-4705401-A1 | RHEOLOGY MODIFIER FOR SEALANT OR ADHESIVE FORMULATIONS | Elementis Specialties, Inc. (US) | 2026-03-11 | — | — | EP | claimed |
| US-20240376293-A1 | RHEOLOGY MODIFIER FOR SEALANT OR ADHESIVE FORMULATIONS | ELEMENTIS SPECIALTIES, INC. (US) | 2024-11-14 | — | — | US | claimed |
| WO-2024229220-A1 | RHEOLOGY MODIFIER FOR SEALANT OR ADHESIVE FORMULATIONS | ELEMENTIS SPECIALTIES, INC. (US) | 2024-11-07 | — | — | WO | claimed |
| US-12110436-B2 | Co/Cu selective wet etchant | VERSUM MATERIALS US, LLC (US) | 2024-10-08 | — | — | US | claimed |
| EP-3684887-B1 | ETCHING SOLUTION FOR SIMULTANEOUSLY REMOVING SILICON AND SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| US-20240271040-A1 | Etching Solution For Selectively Removing Silicon-Germanium Alloy From A Silicon-Germanium/ Silicon Stack During Manufacture Of A Semiconductor Device | VERSUM MATERIALS US, LLC | 2024-08-15 | — | — | US | claimed |
| US-20240099297-A1 | HIGHLY LOADED EMULSIFIABLE CONCENTRATE FORMULATION OF TRICLOPYR AND PICLORAM | Adama Australia Pty Limited (AU) | 2024-03-28 | — | — | US | claimed |
| US-11929257-B2 | Etching solution and method for aluminum nitride | VERSUM MATERIALS US, LLC (US) | 2024-03-12 | — | — | US | claimed |
| CN-117616102-A | Etching solution for selectively removing silicon-germanium alloy from silicon-germanium/silicon stack during semiconductor device fabrication | 弗萨姆材料美国有限责任公司 | 2024-02-27 | — | — | CN | claimed |
| EP-1813667-A1 | Cleaning formulations | Air Products and Chemicals, Inc. (US) | 2007-08-01 | — | — | EP | claimed |
| CN-1295307-C | Friction modifier alkoxyamine salts of carboxylic acids as additives for fuel compsns. and methods of use thereof | ETHYL CO (US) | 2007-01-17 | — | — | CN | claimed |
| CN-1295306-C | Fuel composition additive used for reducing sediment formed in combustion chamber | ETHYL CO (US) | 2007-01-17 | — | — | CN | claimed |
| EP-1627259-A1 | COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-02-22 | — | — | EP | claimed |
| US-6951710-B2 | Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-10-04 | — | — | US | claimed |
| WO-2004107056-A1 | COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-12-09 | — | — | WO | claimed |
| US-20040234904-A1 | Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof | VERSUM MATERIALS US, LLC | 2004-11-25 | — | — | US | claimed |
| CN-1539929-A | Friction modifier alkoxyamine salts of carboxylic acids as additives for fuel compsns. and methods of use thereof | 乙基公司 | 2004-10-27 | — | — | CN | claimed |
| CN-1534083-A | Fuel composition additive used for reducing sediment formed in combustion chamber | 乙基公司 | 2004-10-06 | — | — | CN | claimed |
| US-6165952-A | Ashless rust inhibitor lubricant compositions | KING INDUSTRIES, INC. (US) | 2000-12-26 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12637616-B2 | Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device | KCNH3, F7, KCNH2 | CA1 41/4885CA2 150/4885CA9 160/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.