SCHEMBL3834150

SCHEMBL3834150

C=CCOC(=O)C(=C)CCCC

nearest known ligand 0.56

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.56
HPGD P15428 1/20 0.40
CES1 P23141 2/20 0.37
CES2 O00748 1/20 0.37
FAAH O00519 3/20 0.36
ALDH1A1 P00352 2/20 0.34
TP53 P04637 1/20 0.34
ATM Q13315 1/20 0.34
CYP3A4 P08684 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
DGKA P23743 1/20 0.33
CA1 P00915 1/20 0.33
MAPT P10636 1/20 0.33
CACNA1B Q00975 1/20 0.33
APBA1 Q02410 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL324970 0.95 TSHR (0.64) TSHRHPGDCES1CES2FAAH
SCHEMBL325188 0.93 TSHR (0.67) TSHRCES1CES2FAAHALDH1A1
SCHEMBL9709313 0.93 TSHR (0.67) TSHRCES1CES2FAAHALDH1A1
SCHEMBL6126194 0.93 TSHR (0.67) TSHRCES1CES2FAAHALDH1A1
SCHEMBL4698282 0.89 TSHR (0.50) TSHRHPGDCES1CES2FAAH
SCHEMBL352760 0.86 TSHR (0.46) TSHRHPGDCES1CES2FAAH
SCHEMBL351663 0.82 TSHR (0.53) TSHRHPGDCES1CES2FAAH
SCHEMBL16671847 0.81 TSHR (0.40) TSHRALDH1A1CYP3A4TDP1MAPT
SCHEMBL9960430 0.81 TSHR (0.40) TSHRALDH1A1CYP3A4TDP1MAPT
SCHEMBL352592 0.80 TSHR (0.55) TSHRCES1CES2FAAHALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107759987-A A kind of 3D printing toughness reinforcing PLA material 黑龙江鑫达企业集团有限公司 2018-03-06 CN claimed
US-4690881-A Liquid developer for electrophotography RICOH CO., LTD. (JP) 1987-09-01 US claimed
CN-110249019-B Adhesive composition 住友化学株式会社 2023-05-26 CN disclosed
CN-115594817-B Acrylic acid modified polyurethane resin for pure water-based ink and preparation method thereof 广州立诺新材料科技有限公司 2023-05-09 CN disclosed
CN-110651017-B Adhesive composition 住友化学株式会社 2021-08-06 CN disclosed
CN-108368404-B Adhesive composition 住友化学株式会社 2020-10-30 CN disclosed
CN-110651017-A Adhesive composition 住友化学株式会社 2020-01-03 CN disclosed
CN-109749220-A A kind of degradable shoes materials of novel pla-pcl and preparation method 石狮市中纺学服装及配饰产业研究院 2019-05-14 CN disclosed
US-20190076687-A1 Microcapsules, Method for Preparing Microcapsules, Fire-Extinguishing Agents, Materials, Coatings, and Articles Based Thereupon LLC RUSINTECH (RU) 2019-03-14 US disclosed
CN-107931530-A A kind of sand mold riser runner and preparation method 四川共享铸造有限公司 2018-04-20 CN disclosed
EP-3228366-A1 MICROCAPSULES, METHOD FOR PRODUCING THEREOF AND FLAME RETARDANT AGENTS, MATERIALS, COATINGS AND PRODUCTS BASED THEREON Limited Liability Company "Rusintech" (RU) 2017-10-11 EP disclosed
US-20150322070-A1 PIPERIDINE INHIBITORS OF JANUS KINASE 3 AUSPEX PHARMACEUTICALS, INC. 2015-11-12 US disclosed
EP-1651687-B1 RANDOM ETHYLENE/ALKYL ACRYLATE COPOLYMERS, COMPOUNDS AND ELASTOMERIC COMPOSITIONS THEREOF WITH IMPROVED LOW TEMPERATURE PROPERTIES DU PONT (US) 2009-08-26 EP disclosed
US-7320854-B2 Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent JSR CORPORATION (JP) 2008-01-22 US disclosed
US-7153918-B2 Random ethylene/alkyl acrylate copolymers, compounds and elastomeric compositions thereof with improved low temperature properties E. I. DU PONT DE NEMOURS AND COMPANY (US) 2006-12-26 US disclosed
US-20050020775-A1 Random ethylene/alkyl acrylate copolymers, compounds and elastomeric compositions thereof with improved low temperature properties DUPONT POLYMERS, INC. 2005-01-27 US disclosed
EP-1494072-A2 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR Corporation (JP) 2005-01-05 EP disclosed
US-20040265737-A1 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR CORPORATION (JP) 2004-12-30 US disclosed
WO-1990003411-A1 METHOD OF PREPARING REINFORCED RUBBER AND REINFORCED RUBBER PRODUCTS INSTITUTET POLYMERUTVECKLING AB (SE) 1990-04-05 WO disclosed
US-4690881-A Liquid developer for electrophotography RICOH CO., LTD. (JP) 1987-09-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150322070-A1 PIPERIDINE INHIBITORS OF JANUS KINASE 3 JAK2, JAK3, PAK3 TSHR 3548/4885HPGD 1697/4885CES1 2452/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.