SCHEMBL38348

SCHEMBL38348

OCN(CO)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL28573238 1.00
SCHEMBL931012 1.00
Hydrochloric Acid SCHEMBL2127639 0.94
Methane SCHEMBL4071167 0.94
Water SCHEMBL8055195 0.94
Fluoride SCHEMBL1813540 0.94
Ethane SCHEMBL21355765 0.89
Methane SCHEMBL8937711 0.89
Boric Acid SCHEMBL3344159 0.85 LMNA (0.36)
Trolamine SCHEMBL8213273 0.78 MAPT (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5113 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4720199-A1 SELF-CROSSLINKABLE URETHANE (METH)ACRYLATES ARKEMA France (FR) 2026-04-08 EP claimed
US-20250381173-A1 Long-Lasting Anaesthetic Formulation BERTIE INT AB (SE) 2025-12-18 US claimed
US-20250383599-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND RESOLUTION YCCHEM CO LTD (KR) 2025-12-18 US claimed
US-20250345385-A1 MIXTURES AND FORMULATIONS COMPRISING AN ALKYL AMMONIUM EDTA SALT CAMURUS AB (SE) 2025-11-13 US claimed
US-12448542-B2 Slurry composition for polishing organic film KCTECH CO., LTD. (KR) 2025-10-21 US claimed
US-20250295790-A1 LECTIN-TARGETING CONJUGATES HELMHOLTZ ZENTRUM INFEKTIONSFORSCHUNG GMBH (DE) 2025-09-25 US claimed
EP-4607277-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION Ycchem Co., Ltd. (KR) 2025-08-27 EP claimed
US-20250199406-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION YCCHEM CO., LTD. (KR) 2025-06-19 US claimed
US-12305079-B2 CMP slurry composition for polishing polycrystalline silicon and polishing method using same KCTECH CO., LTD. (KR) 2025-05-20 US claimed
US-20250145859-A1 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING KCTECH CO., LTD. (KR) 2025-05-08 US claimed
US-4363796-A USING TRIMETHYLOLMELAMINE SOCIETE ANONYME DITE: L'OREAL (FR) 1982-12-14 US claimed
US-4336347-A UNSATURATED DICARBOXYLIC ACID, PHENOL, FORMALDEHYDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1982-06-22 US claimed
US-4291148-A Process for preparation of a phenolic-polybutadiene-HCHO resin composition useful for laminated sheet SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-09-22 US claimed
US-RE30670-E NEGATIVE-ACTING; BASE LAYER, SLIGHTLY CROSSLINKED POLYSILOXANE LAYER, AND LAYER CONTAINING PHOTOPOLYMERIZABLE COMPOUND TORAY INDUSTRIES, INC. (JP) 1981-07-07 US claimed
US-4259395-A POLYBUTADIENE MODIFIED WITH PHENOLIC RESIN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-03-31 US claimed
US-4219624-A Stabilization of amine catalysts in a composition with halogenated polyols for use in polyurethane foam production OLIN CORPORATION (US) 1980-08-26 US claimed
US-4148658-A BENZOYLMETHYLENE-BENSOTHIAZOLYIDEND-THIAZOLIDONE COMPOUND, AMINE, AND AMINOARYLCARBONYL COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1979-04-10 US claimed
US-4086093-A POLYSILOXANE, PHOTOADHESIVE, PHOTOPOLYMERIZABLE TORAY INDUSTRIES, INC. (JA) 1978-04-25 US claimed
US-4044148-A ANTIALLERGY, ANTIANAPHYLACTIC, N,N*-HYDROXY- OR HALO-PHENYL-PHENYLENE DIOXAMIC ACID THE UPJOHN COMPANY (US) 1977-08-23 US claimed
US-3980579-A FOR PREPARATION OF POLYURETHANE FOAMS; TERTIARY AMINE, SULFUR-CONTAINING ORGANOTIN COMPOUND OLIN CORPORATION (US) 1976-09-14 US claimed