SCHEMBL383574

SCHEMBL383574

CCN(CC)C1CCCC1

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ADH1A P07327 6/20 0.46
ADH1C P00326 4/20 0.46
ALDH1A1 P00352 3/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
KDM4E B2RXH2 1/20 0.36
SIGMAR1 Q99720 2/20 0.35
TMEM97 Q5BJF2 1/20 0.35
EBP Q15125 1/20 0.35
LTA4H P09960 1/20 0.35
HPGD P15428 1/20 0.34
PHGDH O43175 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL611858 0.97 ADH1A (0.50) ADH1AADH1CALDH1A1SMN1; SMN2MEN1
SCHEMBL613463 0.97 ADH1A (0.50) ADH1AADH1CALDH1A1SMN1; SMN2MEN1
Phosphine SCHEMBL27880054 0.97 ADH1A (0.44) ADH1AADH1CALDH1A1SMN1; SMN2MEN1
SCHEMBL612572 0.97 ADH1A (0.50) ADH1AADH1CALDH1A1SMN1; SMN2MEN1
SCHEMBL356022 0.97 ADH1A (0.50) ADH1AADH1CALDH1A1SMN1; SMN2MEN1
SCHEMBL23073672 0.97 ADH1A (0.50) ADH1AADH1CALDH1A1SMN1; SMN2MEN1
SCHEMBL150343 0.97 ADH1A (0.50) ADH1AADH1CALDH1A1SMN1; SMN2MEN1
SCHEMBL28388990 0.97 ADH1A (0.50) ADH1AADH1CALDH1A1SMN1; SMN2MEN1
SCHEMBL614355 0.97
Fluoride SCHEMBL9620456 0.94 ADH1A (0.48) ADH1AADH1CALDH1A1SMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 285 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230078413-A1 CURING AGENT FOR EPOXY RESINS HUNTSMAN PETROCHEMICAL LLC (US) 2023-03-16 US claimed
CN-112300645-B Tertiary amine group-containing compound and application thereof in waterborne curing polymer material 武汉双键开姆密封材料有限公司 2022-05-20 CN claimed
CN-112300645-A Tertiary amino-containing compound and application thereof in novel water-based cured high polymer material 武汉双键开姆密封材料有限公司 2021-02-02 CN claimed
EP-1739154-A2 Lubricity additive for fuels Afton Chemical Corporation (US) 2007-01-03 EP claimed
US-20060288638-A1 Lubricity additive for fuels AFTON CHEMICAL CORPORATION 2006-12-28 US claimed
US-6660874-B2 Reacting a Group VA metal trihalide with a Group IIIA compound of the formula RnM1X3-n ( R= c1-c6 alkyl, M= group IIIA metal, X= halogen and n= 1-3)in the presence of a tertiary amine in an organic solvent free of ether SHIPLEY COMPANY, L.L.C. 2003-12-09 US claimed
US-20030199704-A1 Alkyl group VA metal compounds SHIPLEY COMPANY, L.L.C. (US) 2003-10-23 US claimed
US-20020188145-A1 Trialkyl Group VA metal compounds SHIPLEY COMPANY, L.L.C. 2002-12-12 US claimed
EP-0463464-B1 Process for the preparation of 2-chloro-5-methylpyridine BAYER AG (DE) 1995-03-08 EP claimed
EP-0439745-B1 Process for the preparation of 2-chloro-5-methyl-pyridine BAYER AG (DE) 1994-08-03 EP claimed
US-5103011-A PREPARATION OF 2-CHLORO-5- METHYL-PYRIDINE BAYER AKTIENGESELLSCHAFT (DE) 1992-04-07 US claimed
US-5099025-A PREPARATION OF 2-CHLORO-5-METHYL-PYRIDINE BAYER AKTIENGESELLSCHAFT (DE) 1992-03-24 US claimed
EP-0463464-A1 Process for the preparation of 2-chloro-5-methylpyridine BAYER AG (DE) 1992-01-02 EP claimed
EP-0439745-A2 Process for the preparation of 2-chloro-5-methyl-pyridine BAYER AG (DE) 1991-08-07 EP claimed
US-12195580-B2 Curing agent for epoxy resins HUNTSMAN PETROCHEMICAL LLC 2025-01-14 US disclosed
US-12091495-B2 Curing agent for epoxy resins HUNTSMAN PETROCHEMICAL LLC (US) 2024-09-17 US disclosed
US-11996557-B2 Direct regeneration of lithium ion cathodes by ionothermal relithiation UT-BATTELLE, LLC (US) 2024-05-28 US disclosed
EP-0206621-B1 PROCESS FOR DISPROPORTIONATING SILANES MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-11-15 EP disclosed
EP-0324174-A2 Process for the preparation of 2-chloro-5-methylpyridine BAYER AG (DE) 1989-07-19 EP disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed