Iodide

Iodide

SCHEMBL3836087

CCC[N+](C)(C)C.[I-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL30549382 1.00 DNM1 (0.56)
SCHEMBL13169630 0.96
SCHEMBL160184 0.96
Hydrochloric Acid SCHEMBL196186 0.92
Hydrochloric Acid SCHEMBL20769541 0.92 DNM1 (0.56)
Propane SCHEMBL29025406 0.92 DNM1 (0.50)
Fluoride Ion SCHEMBL15792436 0.92
Bromide SCHEMBL34464663 0.92 DNM1 (0.56)
Water SCHEMBL813156 0.92
Bromide SCHEMBL814241 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114561072-B Preparation method of inorganic filler doped modified FEP composite dielectric film 浙江工业大学 2023-07-25 CN claimed
CN-114561072-A Preparation method of inorganic filler doped modified FEP composite dielectric film 浙江工业大学 2022-05-31 CN claimed
CN-112608258-A Method for synthesizing 4,4' -dichlorodiphenyl sulfone by sulfoxide oxidation method 江苏傲伦达科技实业股份有限公司 2021-04-06 CN claimed
US-6458168-B1 Hair dyeing method using an aliphatic cationic amine and compound chosen from an aldehyde, a ketone, a quinone, a di-imino-isoindoline, and a 3-aminoisoindolone derivative L'OREAL S.A. (FR) 2002-10-01 US claimed
US-20260071095-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2026-03-12 US disclosed
US-20250320381-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2025-10-16 US disclosed
US-20250282977-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2025-09-11 US disclosed
CN-120118672-A Wetting reversal agent 中国石油化工股份有限公司 2025-06-10 CN disclosed
CN-118416856-B Non-targeted DGT adsorption film for enriching multiple types of new pollutants and preparation method and application thereof 华南师范大学 2025-03-18 CN disclosed
CN-116004208-B Multifunctional shaft cleaning agent and preparation method thereof 四川省蕤峰伟业科技有限公司 2024-11-22 CN disclosed
CN-118416856-A Non-targeted DGT adsorption film for enriching multiple types of new pollutants and preparation method and application thereof 华南师范大学 2024-08-02 CN disclosed
CN-118239957-A Process for the preparation of 2-exo- (2-methylbenzyloxy) -1-methyl-4-isopropyl-7-oxabicyclo [2.2.1] heptane 巴斯夫农业公司 2024-06-25 CN disclosed
WO-2008082269-A1 METHODS FOR PREPARING COMPOSITES OF SUBSTRATE-MOLECULAR SIEVE Industry-University Cooperation Foundation Sogang University (KR) 2008-07-10 WO disclosed
EP-1873862-A1 ELECTROLYTE COMPOSITION FOR PHOTOELECTRIC CONVERTER AND PHOTOELECTRIC CONVERTER USING SAME Nippon Kayaku Kabushiki Kaisha (JP) 2008-01-02 EP disclosed
CN-1140174-C Compositions and methods for treating plants with exogenous chemicals ������ɽ���� 2004-03-03 CN disclosed
CN-1344136-A Process and compsns. promotijng biological effectiveness of exogenous chemical substances in plants MONSANTO CO (US) 2002-04-10 CN disclosed
CN-1241904-A Compositions and methods for treating plants with exogenous chemicals MONSANTO CO (US) 2000-01-19 CN disclosed
CN-1241905-A Compositions and methods for treating plants with exogenous chemicals MONSANTO CO (US) 2000-01-19 CN disclosed
US-4294904-A Inductive development materials for a magnetic development process XEROX CORPORATION (US) 1981-10-13 US disclosed
US-4246151-A COMPOSITION COMPRISING THE REACTION PRODUCT OF AN EPOXIDIZED ADDITION POLYMER WITH AN AMINE, PLUS A PARTIALLY OR FULLY BLOCKED POLYISOCYANATE AKZO N.V. (NL) 1981-01-20 US disclosed