Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | JAK2 | O60674 | 1/20 | 0.33 |
| ▸ | JAK3 | P52333 | 1/20 | 0.33 |
| ▸ | PSMB5 | P28074 | 4/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | CXCR3 | P49682 | 1/20 | 0.31 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.30 |
| ▸ | TYMP | P19971 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3838544 | 0.85 | HDAC1 (0.33) | PSMB5RAB9ANPC1 | |
| SCHEMBL21722770 | 0.80 | JAK2 (0.35) | JAK2JAK3PSMB5RAB9ANPC1 | |
| SCHEMBL3840270 | 0.78 | RAB9A (0.37) | JAK2JAK3PSMB5RAB9ANPC1 | |
| SCHEMBL28469655 | 0.77 | JAK2 (0.33) | JAK2JAK3PSMB5RAB9ANPC1 | |
| SCHEMBL3836496 | 0.77 | JAK2 (0.33) | JAK2JAK3PSMB5RAB9ANPC1 | |
| SCHEMBL11201526 | 0.76 | TYMP (0.41) | JAK2JAK3PSMB5RAB9ANPC1 | |
| SCHEMBL3233355 | 0.76 | TYMP (0.41) | JAK2JAK3PSMB5RAB9ANPC1 | |
| SCHEMBL21057468 | 0.76 | TYMP (0.41) | JAK2JAK3PSMB5RAB9ANPC1 | |
| SCHEMBL18244171 | 0.76 | TYMP (0.41) | JAK2JAK3PSMB5RAB9ANPC1 | |
| SCHEMBL3502363 | 0.76 | TYMP (0.41) | JAK2JAK3PSMB5RAB9ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| WO-2003081223-A2 | SENSORS WITH VARIABLE RESPONSE BEHAVIOR | HRL LABORATORIES, LLC (US) | 2003-10-02 | — | — | WO | claimed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| WO-2024085044-A1 | POLYMERIZABLE COMPOSITION AND NORBORNENE RESIN | RIMTEC株式会社 | 2024-04-25 | — | — | WO | disclosed |
| WO-2024085043-A1 | CATALYST LIQUID AND POLYMERIZABLE COMPOSITION | RIMTEC株式会社 | 2024-04-25 | — | — | WO | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-116569282-A | Polymerizable composition and resin-impregnated superconducting coil | RIMTEC株式会社 | 2023-08-08 | — | — | CN | disclosed |
| WO-2020196642-A1 | FILM-FORMING COMPOSITION | 日産化学株式会社 | 2020-10-01 | — | — | WO | disclosed |
| US-10647821-B2 | Production process for silicone polymer | TORAY FINE CHEMICALS CO., LTD. (JP) | 2020-05-12 | — | — | US | disclosed |
| US-20190023848-A1 | PRODUCTION PROCESS FOR SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2019-01-24 | — | — | US | disclosed |
| EP-2628744-A1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-08-21 | — | — | EP | disclosed |
| US-20130210236-A1 | SILICON-CONTAINING SURFACE MODIFIER, RESIST UNDERLAYER FILM COMPOSITION CONTAINING THIS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| EP-2599819-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| EP-2599818-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| US-20130137041-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| CN-1941359-A | Porous composite material and method for making same | IBM (US) | 2007-04-04 | — | — | CN | disclosed |