⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27731172 | 0.71 | SLC6A3 (0.31) | — | |
| SCHEMBL8653195 | 0.69 | — | — | |
| SCHEMBL27465096 | 0.67 | — | — | |
| SCHEMBL17988284 | 0.67 | — | — | |
| SCHEMBL2575530 | 0.67 | SLC6A3 (0.33) | — | |
| SCHEMBL329070 | 0.67 | — | — | |
| SCHEMBL21995884 | 0.67 | SLC6A3 (0.33) | — | |
| SCHEMBL21086749 | 0.67 | — | — | |
| SCHEMBL21332245 | 0.67 | — | — | |
| SCHEMBL83478 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 319 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7862980-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-04 | — | — | US | claimed |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | claimed |
| EP-1004568-B1 | Novel ester compounds, polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-01-25 | — | — | EP | claimed |
| US-6596463-B2 | Photosensitivity, resolution, chemical resistance | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2003-07-22 | — | — | US | claimed |
| US-6312867-B1 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-06 | — | — | US | claimed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| CN-112368641-A | Photosensitive resin composition, photosensitive sheet, cured film of photosensitive resin composition and photosensitive sheet, method for producing cured film, and electronic component | 东丽株式会社 | 2021-02-12 | — | — | CN | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-20190278175-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-09-12 | — | — | US | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-1001946-A4 | QUINOLINE AND QUINOXALINE COMPOUNDS WHICH INHIBIT PLATELET-DERIVED GROWTH FACTOR AND/OR p56?1ck TYROSINE KINASES | RHONE POULENC RORER PHARMA (US) | 2000-07-26 | — | — | EP | disclosed |
| WO-2000031049-A1 | QUINOLINE AND QUINOXALINE COMPOUNDS AS PDGF-R AND/OR LCK TYROSINE KINASE INHIBITORS | AVENTIS PHARMACEUTICALS PRODUCTS INC. (US) | 2000-06-02 | — | — | WO | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |
| EP-1001946-A1 | QUINOLINE AND QUINOXALINE COMPOUNDS WHICH INHIBIT PLATELET-DERIVED GROWTH FACTOR AND/OR p56?1ck TYROSINE KINASES | RHONE-POULENC RORER PHARMACEUTICALS, INC. (US) | 2000-05-24 | — | — | EP | disclosed |
| WO-1998054157-A1 | QUINOLINE AND QUINOXALINE COMPOUNDS WHICH INHIBIT PLATELET-DERIVED GROWTH FACTOR AND/OR p561ck TYROSINE KINASES | RHÔNE-POULENC RORER PHARMACEUTICALS INC. (US) | 1998-12-03 | — | — | WO | disclosed |
| EP-0031505-A1 | Monoazo dyestuffs of the amino-pyridine series, their preparation and use in dyeing thermoplastic synthetics in the mass, as well as dyestuff compositions | BASF Aktiengesellschaft (DE) | 1981-07-08 | — | — | EP | disclosed |
| US-4210583-A | FAST DYEINGS ON POLYESTERS AND THEIR BLENDS WITH COTTON | BASF AKTIENGESELLSCHAFT (DE) | 1980-07-01 | — | — | US | disclosed |