Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 3/20 | 0.65 |
| ▸ | CA2 | P00918 | 3/20 | 0.65 |
| ▸ | CA9 | Q16790 | 3/20 | 0.65 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.65 |
| ▸ | CA1 | P00915 | 2/20 | 0.65 |
| ▸ | CA3 | P07451 | 2/20 | 0.65 |
| ▸ | CA4 | P22748 | 2/20 | 0.65 |
| ▸ | GLA | P06280 | 1/20 | 0.65 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.65 |
| ▸ | MMP3 | P08254 | 1/20 | 0.46 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 6/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.40 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.40 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.40 |
| ▸ | LTA4H | P09960 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adamantane SCHEMBL4444785 | 1.00 | CA12 (0.65) | CA12CA2CA9CA14CA1 | |
| Adamantane SCHEMBL5826202 | 1.00 | CA12 (0.65) | CA12CA2CA9CA14CA1 | |
| Adamantane SCHEMBL29166015 | 0.97 | CA12 (0.61) | CA12CA2CA9CA14CA1 | |
| Phenol SCHEMBL27766689 | 0.89 | CA12 (0.58) | CA12CA2CA9CA14CA1 | |
| Phenol SCHEMBL11852630 | 0.89 | CA12 (0.58) | CA12CA2CA9CA14CA1 | |
| Phenol SCHEMBL936069 | 0.81 | — | — | |
| Phenol SCHEMBL11316144 | 0.81 | CA12 (0.85) | CA12CA2CA9CA14CA1 | |
| Phenol SCHEMBL27899230 | 0.81 | CA12 (0.85) | CA12CA2CA9CA14CA1 | |
| Phenol SCHEMBL10974607 | 0.81 | CA12 (0.85) | CA12CA2CA9CA14CA1 | |
| Phenol SCHEMBL27535722 | 0.81 | CA12 (0.85) | CA12CA2CA9CA14CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 213 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114181091-A | Synthesis process of adamantane triphenylamine | 苏州久显新材料有限公司 | 2022-03-15 | — | — | CN | claimed |
| CN-105601885-B | Ultraviolet light solidfication water polyurethane acrylate and preparation method thereof | 贾学明 | 2018-05-29 | — | — | CN | claimed |
| CN-105399913-B | UV-cured polyurethane acrylate and preparation method thereof | 贾学明 | 2018-05-29 | — | — | CN | claimed |
| CN-105440260-B | UV-cured polyurethane acrylate and preparation method thereof | 贾学明 | 2018-05-29 | — | — | CN | claimed |
| CN-101613089-B | Absorption liquid for gas desulfurization and desulfurization method thereof | XITAI SU | 2011-08-03 | — | — | CN | claimed |
| US-20240242967-A1 | Polymer For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| EP-4398037-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-12032293-B2 | Composition for forming organic film, patterning process, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| EP-4390547-A1 | POLYMER FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3828630-B1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | SHINETSU CHEMICAL CO (JP) | 2024-06-19 | — | — | EP | disclosed |
| CN-114181091-B | Synthesis process of adamantane triphenylamine | 维思普新材料（苏州）有限公司 | 2024-06-14 | — | — | CN | disclosed |
| CN-114380849-B | Material for forming organic film, method for forming pattern, and compound for forming organic film | 信越化学工业株式会社 | 2024-05-24 | — | — | CN | disclosed |
| US-20100099044-A1 | Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film | SHIN-ETSU CHEMICAL CO.,LTD. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-7235866-B2 | Low dielectric constant film material, film and semiconductor device using such material | FUJITSU LIMITED (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20060022357-A1 | Low dielectric constant film material, film and semiconductor device using such material | FUJITSU LIMITED (JP) | 2006-02-02 | — | — | US | disclosed |
| US-6958525-B2 | siloxane resin and polycarbosilane dissolved in solvent. By using this solution, a low dielectric film is formed which contains siloxane resin and polycarbosilane bonded to the siloxane resin. Material of a low dielectric film is provided | FUJITSU LIMITED (JP) | 2005-10-25 | — | — | US | disclosed |
| US-20030207131-A1 | siloxane resin and polycarbosilane dissolved in solvent. By using this solution, a low dielectric film is formed which contains siloxane resin and polycarbosilane bonded to the siloxane resin. Material of a low dielectric film is provided | FUJITSU LIMITED | 2003-11-06 | — | — | US | disclosed |
| US-6613834-B2 | Film forming material comprising siloxane resin and polycarbosilane dissolved together, having relative dielectric constant in range from about 2.5 to 3.0 | FUJITSU LIMITED (JP) | 2003-09-02 | — | — | US | disclosed |
| US-20010033026-A1 | Film forming material comprising siloxane resin and polycarbosilane dissolved together, having relative dielectric constant in range from about 2.5 to 3.0 | FUJITSU LIMITED (JP) | 2001-10-25 | — | — | US | disclosed |