Butane

Butane

SCHEMBL3840388

CC(C)O[SiH2]OC(C)C.CCCC

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706060 0.86
Hydrochloric Acid SCHEMBL27663825 0.82
SCHEMBL27839497 0.82
Diethylamine SCHEMBL27822718 0.79 TP53 (0.44)
SCHEMBL1609092 0.75
Butane SCHEMBL2495676 0.75
SCHEMBL31624444 0.72
Butadiene SCHEMBL1227570 0.71
SCHEMBL9458364 0.69 TSHR (0.33)
SCHEMBL707850 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250313680-A1 TIRE RUBBER COMPOSITIONS COMBINING BAGASSE-CONTAINING GUAYULE RUBBER WITH SILANE AND RELATED METHODS BRIDGESTONE CORPORATION (JP) 2025-10-09 US disclosed
WO-2025022866-A1 SHEDDING FILM, LAMINATE, AND PACKAGING CONTAINER 東洋製罐グループホールディングス株式会社 2025-01-30 WO disclosed
US-20240059800-A1 MODIFIED GUAYULE RESIN PRODUCT AND RELATED PROCESSES BRIDGESTONE CORPORATION (JP) 2024-02-22 US disclosed
US-20240052139-A1 TIRE RUBBER COMPOSITIONS COMBINING BAGASSE-CONTAINING GUAYULE RUBBER WITH SILANE AND RELATED METHODS BRIDGESTONE CORPORATION (JP) 2024-02-15 US disclosed
EP-4263567-A1 MODIFIED GUAYULE RESIN PRODUCT AND RELATED PROCESSES BRIDGESTONE CORPORATION (JP) 2023-10-25 EP disclosed
EP-4263621-A1 TIRE RUBBER COMPOSITIONS COMBINING BAGASSE-CONTAINING GUAYULE RUBBER WITH SILANE AND RELATED METHODS BRIDGESTONE CORPORATION (JP) 2023-10-25 EP disclosed
WO-2022133477-A1 MODIFIED GUAYULE RESIN PRODUCT AND RELATED PROCESSES BRIDGESTONE CORPORATION (JP) 2022-06-23 WO disclosed
WO-2022133478-A1 TIRE RUBBER COMPOSITIONS COMBINING BAGASSE-CONTAINING GUAYULE RUBBER WITH SILANE AND RELATED METHODS BRIDGESTONE CORPORATION (JP) 2022-06-23 WO disclosed
US-10408984-B2 Optical phase difference component, composite optical component, incorporating optical phase difference component, and method for manufacturing optical phase difference component JX NIPPON OIL AND ENERGY CORPORATION (JP) 2019-09-10 US disclosed
US-20170199313-A1 OPTICAL PHASE DIFFERENCE COMPONENT, COMPOSITE OPTICAL COMPONENT, INCORPORATING OPTICAL PHASE DIFFERENCE COMPONENT, AND METHOD FOR MANUFACTURING OPTICAL PHASE DIFFERENCE COMPONENT JX NIPPON OIL & ENERGY CORPORATION (JP) 2017-07-13 US disclosed
EP-1428828-A1 PROCESS FOR PREPARATION OF ALKOXYSILANES TOAGOSEI CO., LTD. (JP) 2004-06-16 EP disclosed
US-6749944-B2 VAPOR DEPOSITION, OSCILLATION, HEATING USING ORGANOSILICON COMPOUND; FORMING DIELECTRIC JSR CORPORATION (JP) 2004-06-15 US disclosed
US-20040013972-A1 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2004-01-22 US disclosed
EP-1350814-A1 RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX JSR Corporation (JP) 2003-10-08 EP disclosed
US-20030077461-A1 Stacked film, insulating film and substrate for semiconductor JSR CORPORATION (JP) 2003-04-24 US disclosed
US-20030064303-A1 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern JSR CORPORATION (JP) 2003-04-03 US disclosed
EP-1298176-A2 Stacked film insulating film and substrate for semiconductor JSR Corporation (JP) 2003-04-02 EP disclosed
US-20030059628-A1 Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor JSR CORPORATION (JP) 2003-03-27 US disclosed
EP-1295924-A2 Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor JSR Corporation (JP) 2003-03-26 EP disclosed
EP-1235104-A1 COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN JSR Corporation (JP) 2002-08-28 EP disclosed