⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethylamine SCHEMBL28655254 | 0.92 | — | — | |
| SCHEMBL28560201 | 0.86 | — | — | |
| SCHEMBL707439 | 0.84 | — | — | |
| SCHEMBL704129 | 0.83 | — | — | |
| SCHEMBL6703622 | 0.81 | LMNA (0.34) | — | |
| SCHEMBL8619851 | 0.79 | — | — | |
| SCHEMBL6032545 | 0.79 | TSHR (0.38) | — | |
| SCHEMBL14690126 | 0.79 | TSHR (0.38) | — | |
| SCHEMBL28419929 | 0.79 | TSHR (0.38) | — | |
| SCHEMBL6705278 | 0.79 | TSHR (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109641835-A | Method for producing carbamate | 国立研究开发法人产业技术综合研究所 | 2019-04-16 | — | — | CN | disclosed |
| CN-104955900-B | Curable composition containing polysiloxane and cured product thereof | 中央硝子株式会社 | 2017-03-15 | — | — | CN | disclosed |
| US-9512272-B2 | Curable composition containing silicone, and cured product thereof | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-12-06 | — | — | US | disclosed |
| US-20150322211-A1 | Curable Composition Containing Silicone, and Cured Product Thereof | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-12 | — | — | US | disclosed |
| CN-103131431-B | MATERIALS FOR DISPLAY, crystal aligning agent and liquid crystal display device | JSR CO., LTD. (JP) | 2015-10-07 | — | — | CN | disclosed |
| CN-104955900-A | Curable composition containing polysiloxane and cured product thereof | CENTRAL GLASS CO LTD | 2015-09-30 | — | — | CN | disclosed |
| CN-102311739-B | The manufacture method of liquid crystal aligning agent, liquid crystal display device and liquid crystal display device | JSR CO., LTD. (JP) | 2015-09-16 | — | — | CN | disclosed |
| CN-103131431-A | Display material, liquid crystal alignment agent and liquid crystal display element | JSR CORP | 2013-06-05 | — | — | CN | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| CN-102311739-A | The method of manufacture of liquid crystal aligning agent, liquid crystal display device and liquid crystal display device | JSR CORP | 2012-01-11 | — | — | CN | disclosed |
| CN-101812304-A | Liquid crystal aligning agent, liquid crystal display device and manufacture method thereof | JSR CO LTD | 2010-08-25 | — | — | CN | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |