Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | MITF | O75030 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | GFER | P55789 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.45 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.45 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
| ▸ | FABP7 | O15540 | 1/20 | 0.39 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.39 |
| ▸ | FURIN | P09958 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3838122 | 0.92 | HAO1 (0.50) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL30148747 | 0.92 | HAO1 (0.50) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL5689227 | 0.90 | LTA4H (0.50) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL10970729 | 0.90 | HAO1 (0.49) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL10733771 | 0.88 | HAO1 (0.49) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL11298933 | 0.87 | HTT (0.54) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL11298696 | 0.87 | HTT (0.54) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL11301110 | 0.87 | HTT (0.54) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL9047946 | 0.87 | LTA4H (0.53) | HAO1ALDH1A1SMN1; SMN2MEN1MITF | |
| SCHEMBL9049234 | 0.87 | HAO1 (0.43) | HAO1ALDH1A1SMN1; SMN2MEN1MITF |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6884862-B2 | Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film | JSR CORPORATION (JP) | 2005-04-26 | — | — | US | claimed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1245638-B1 | Composition for insulating film formation | JSR CORP (JP) | 2009-01-14 | — | — | EP | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| EP-1099719-B1 | Diyne-containing (co) polymer, processes for producing the same, and cured film | JSR CORP (JP) | 2007-01-17 | — | — | EP | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| US-20060210812-A1 | Insulating film and method of forming the same | JSR CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1696478-A1 | INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-6528605-B1 | Diyne-containing (co)polymer, processes for producing the same, and cured film | JSR CORPORATION (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1254917-A1 | Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film | JSR Corporation (JP) | 2002-11-06 | — | — | EP | disclosed |
| US-20020161173-A1 | Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-10-31 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| EP-1099719-A1 | Diyne-containing (co) polymer, processes for producing the same, and cured film | JSR Corporation (JP) | 2001-05-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | VCL, BMI1, PUF60 | HAO1 2788/4885ALDH1A1 2731/4885SMN1; SMN2 3834/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.