SCHEMBL3843056

SCHEMBL3843056

O=C(Cl)CN1C(=O)CSC1=S

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GSK3A P49840 8/20 0.71
GSK3B P49841 8/20 0.71
MEN1 O00255 6/20 0.71
KMT2A Q03164 6/20 0.71
GAA P10253 5/20 0.53
ALDH1A1 P00352 5/20 0.53
RECQL P46063 4/20 0.53
MAPT P10636 3/20 0.53
TDP1 Q9NUW8 3/20 0.53
POLB P06746 2/20 0.53
L3MBTL1 Q9Y468 2/20 0.53
THRB P10828 2/20 0.53
HTT P42858 2/20 0.53
KDM4E B2RXH2 1/20 0.44
ALPL P05186 1/20 0.44
ALPI P09923 1/20 0.44
ALPG P10696 1/20 0.44
PLCG1 P19174 1/20 0.44
CASP6 P55212 1/20 0.44
HSD17B10 Q99714 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Rhodanine-3-Acetic Acid SCHEMBL2121316 0.83 GSK3A (1.00) GSK3AGSK3BMEN1KMT2AGAA
Rhodanine-3-Acetic Acid SCHEMBL250012 0.83 GSK3A (1.00) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL28286248 0.82 MEN1 (0.60) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL3083931 0.81 GSK3A (0.71) GSK3AGSK3BMEN1KMT2AGAA
Rhodanine-3-Acetic Acid SCHEMBL1372027 0.81 GSK3A (0.96) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL22092327 0.81 GAA (0.57) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL22532392 0.77 GSK3A (0.65) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL2342390 0.77 GSK3A (0.65) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL13038287 0.77 GSK3A (0.65) GSK3AGSK3BMEN1KMT2AGAA
SCHEMBL367565 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109569521-B Rhodanine functionalized MOFs adsorbent and preparation method and application thereof 南昌航空大学 2021-09-14 CN disclosed
EP-1128214-B1 Photosensitive compound and photosensitive resin TOYO GOSEI KOGYO KK (JP) 2009-11-04 EP disclosed
EP-1128214-B1 Photosensitive compound and photosensitive resin TOYO GOSEI KOGYO KK (JP) 2009-11-04 EP disclosed
CN-1208685-C Photosensitive compound and photoresist TOYO GOSEI KOGYO KK (JP) 2005-06-29 CN disclosed
US-6610791-B2 Substituted thiazole derivative; for use in color cathode ray tubes, display tubes, screen printing TOYO GOSAI KOGYO CO., LTD. (JP) 2003-08-26 US disclosed
US-20010047068-A1 Photosensitive compound and photosensitive resin TOYO GOSEI KOGYO CO., LTD. (JP) 2001-11-29 US disclosed
EP-1128214-A1 Photosensitive compound and photosensitive resin Toyo Gosei Kogyo Co., Ltd. (JP) 2001-08-29 EP disclosed
CN-1309329-A Photosensitive compound and photoresist TOYO GOSEI KOGYO KK (JP) 2001-08-22 CN disclosed