2-Ethoxyethanol

2-Ethoxyethanol

SCHEMBL3843427

CCOCCO.[CH2]C

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1679162-B1 Sheet material cutting apparatus for cutting a band-shaped thermal imaging material FUJIFILM CORP (JP) 2009-03-11 EP disclosed
EP-1541301-B1 Sheet material cutting method for cutting a thermal imaging material and sheet material cutting apparatus for cutting a band-shaped thermal imaging material FUJIFILM CORP (JP) 2007-11-14 EP disclosed
EP-1679162-A2 Sheet material cutting method for cutting a thermal imaging material and sheet material cutting apparatus for cutting a band-shaped thermal imaging material FUJI PHOTO FILM CO., LTD. (JP) 2006-07-12 EP disclosed
EP-1541301-A2 Sheet material cutting method for cutting a thermal imaging material and sheet material cutting apparatus for cutting a band-shaped thermal imaging material FUJI PHOTO FILM CO., LTD. (JP) 2005-06-15 EP disclosed
EP-1513011-A1 Heat development apparatus and method FUJI PHOTO FILM CO., LTD. (JP) 2005-03-09 EP disclosed
EP-1513010-A1 Heat development apparatus and method FUJI PHOTO FILM CO., LTD. (JP) 2005-03-09 EP disclosed
EP-1088644-A2 Deformation correcting method, cutting method, deformation correcting apparatus and cutting apparatus for sheet materials FUJI PHOTO FILM CO., LTD. (JP) 2001-04-04 EP disclosed