Trichloroethane

Trichloroethane

SCHEMBL3843667

CC(Cl)(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl.ClC(Cl)Cl

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.67
LMNA P02545 2/20 0.44
ALDH1A1 P00352 2/20 0.36
THRB P10828 1/20 0.36
CYP2E1 P05181 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trichloroethane SCHEMBL768160 1.00
Trichloroethane SCHEMBL8211127 1.00 TSHR (0.67) TSHRLMNAALDH1A1THRBCYP2E1
1,1,2,2-Tetrachloroethane SCHEMBL8594616 0.84 TSHR (0.60) TSHRALDH1A1THRB
Trichloroethane SCHEMBL2842181 0.84
Chloroform SCHEMBL3164509 0.82
Trichloroethane SCHEMBL3833855 0.82 TSHR (1.00) TSHRLMNAALDH1A1THRBCYP2E1
Trichloroethane SCHEMBL10482068 0.82 TSHR (1.00) TSHRLMNAALDH1A1THRBCYP2E1
Trichloroethane SCHEMBL64609 0.82
Trichloroethane SCHEMBL16434 0.82
SCHEMBL11645535 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0838483-B1 Process for preparing absorbent resin NIPPON CATALYTIC CHEM IND (JP) 2009-09-09 EP disclosed
EP-0838483-A2 Process for preparing absorbent resin NIPPON SHOKUBAI CO., LTD. (JP) 1998-04-29 EP disclosed
US-5574121-A Process for preparing an absorbent resin crosslinked with a mixture of trimethylolpropane diacrylate and triacrylate NIPPON SHOKUBAI CO., LTD. (JP) 1996-11-12 US disclosed
EP-0632068-A1 Process for preparing absorbent resin NIPPON SHOKUBAI CO., LTD. (JP) 1995-01-04 EP disclosed