⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL5724297 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL4892269 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL9621464 | 0.91 | — | — | |
| SCHEMBL3314 | 0.89 | — | — | |
| SCHEMBL1740294 | 0.89 | — | — | |
| SCHEMBL8800081 | 0.80 | — | — | |
| Water SCHEMBL1885701 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL10685538 | 0.80 | — | — | |
| SCHEMBL384941 | 0.80 | — | — | |
| Iodide SCHEMBL6470403 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 276 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11851755-B2 | Sequential infiltration synthesis apparatus and a method of forming a patterned structure | ASM IP HOLDING B.V. (NL) | 2023-12-26 | — | — | US | claimed |
| US-20220149175-A1 | STRUCTURES INCLUDING METAL CARBIDE MATERIAL, DEVICES INCLUDING THE STRUCTURES, AND METHODS OF FORMING SAME | ASM IP HOLDING B.V. (NL) | 2022-05-12 | — | — | US | claimed |
| US-20210399111-A1 | TITANIUM ALUMINUM AND TANTALUM ALUMINUM THIN FILMS | ASM IP HOLDING B.V. (NL) | 2021-12-23 | — | — | US | claimed |
| US-11139383-B2 | Titanium aluminum and tantalum aluminum thin films | ASM IP HOLDING B.V. (NL) | 2021-10-05 | — | — | US | claimed |
| US-20200328285-A1 | TITANIUM ALUMINUM AND TANTALUM ALUMINUM THIN FILMS | ASM IP HOLDING B.V. (NL) | 2020-10-15 | — | — | US | claimed |
| US-10458018-B2 | Structures including metal carbide material, devices including the structures, and methods of forming same | ASM IP HOLDING B.V. (NL) | 2019-10-29 | — | — | US | claimed |
| CN-108312274-A | A kind of preparation method of wood ceramics composite material | 郭迎庆 | 2018-07-24 | — | — | CN | claimed |
| US-20180171475-A1 | SEQUENTIAL INFILTRATION SYNTHESIS APPARATUS AND A METHOD OF FORMING A PATTERNED STRUCTURE | ASM IP HOLDING B.V. (NL) | 2018-06-21 | — | — | US | claimed |
| US-9916980-B1 | Method of forming a structure on a substrate | ASM IP HOLDING B.V. (NL) | 2018-03-13 | — | — | US | claimed |
| CN-107739550-A | A kind of detergent for ink | 袁春华 | 2018-02-27 | — | — | CN | claimed |
| EP-1409766-A1 | SYSTEMS AND METHODS FOR DELIVERING AN ULTRAPURE CHEMICAL | L'Air Liquide S. A. à Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2004-04-21 | — | — | EP | claimed |
| WO-2003012163-A2 | INTEGRAL BLOCKS, CHEMICAL DELIVERY SYSTEMS AND METHODS FOR DELIVERING AN ULTRAPURE CHEMICAL | L'AIR LIQUIDE-SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (US) | 2003-02-13 | — | — | WO | claimed |
| US-20030012709-A1 | Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical | AMERICAN AIR LIQUIDE, INC. | 2003-01-16 | — | — | US | claimed |
| US-6436203-B1 | CVD apparatus and CVD method | TOKYO ELECTRON LIMITED (JP) | 2002-08-20 | — | — | US | claimed |
| US-6174563-B1 | FORMING AN INTEGRATED CIRCUIT WHICH INCLUDES A METAL FILM LAYER FOR WIRING | NEC CORPORATION (JP) | 2001-01-16 | — | — | US | claimed |
| US-6141476-A | Hollow waveguide for ultraviolet light and making the same | MATSUURA YUJI (JP) | 2000-10-31 | — | — | US | claimed |
| US-5874777-A | Semiconductor device with enhanced thermal conductivity | Ohmi, Tadahiro (JP) | 1999-02-23 | — | — | US | claimed |
| US-5464666-A | Process for chemical vapor codeposition of copper and aluminum alloys | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1995-11-07 | — | — | US | claimed |
| US-5273775-A | Depositing aluminum onto a patterned copper/silicon/silicon dioxide substrate using a vapor of an aminealane compound | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1993-12-28 | — | — | US | claimed |
| EP-0566040-A2 | Process for selectively depositing copper aluminum alloy onto a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1993-10-20 | — | — | EP | claimed |