SCHEMBL3851041

SCHEMBL3851041

Clc1ccc(C=CCc2ccc(Cl)cc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
AHR P35869 1/20 0.46
CYP1A2 P05177 1/20 0.43
ALDH1A1 P00352 1/20 0.43
MAPT P10636 1/20 0.43
KCNH2 Q12809 3/20 0.42
IDO1 P14902 3/20 0.41
AGXT P21549 2/20 0.41
HSD17B10 Q99714 1/20 0.41
FBP1 P09467 1/20 0.41
KCNA3 P22001 2/20 0.40
GRIK1 P39086 1/20 0.40
GRIK2 Q13002 1/20 0.40
GRIK3 Q13003 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10602496 1.00 AHR (0.46) AHRCYP1A2ALDH1A1MAPTKCNH2
SCHEMBL29804851 0.90 MAOB (0.54) AHRMAPTKCNA3
SCHEMBL8333012 0.90 MAOB (0.54) AHRMAPTKCNA3
SCHEMBL16052780 0.90 MAOB (0.54) AHRMAPTKCNA3
SCHEMBL1931966 0.90 GRIN1 (0.49) ALDH1A1IDO1KCNA3
SCHEMBL1931967 0.90 GRIN1 (0.49) ALDH1A1IDO1KCNA3
SCHEMBL7535804 0.79 AHR (0.48) AHRCYP1A2ALDH1A1MAPTKCNH2
SCHEMBL7535809 0.79 AHR (0.48) AHRCYP1A2ALDH1A1MAPTKCNH2
SCHEMBL10038879 0.77 IDO1 (0.41) ALDH1A1MAPTKCNH2IDO1GRIK1
SCHEMBL7106133 0.77 APP (0.50) CYP1A2ALDH1A1MAPTIDO1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2116527-A1 OXIME COMPOUND, PHOTOSENSITIVE COMPOSITION, COLOR FILTER, METHOD FOR PRODUCTION OF THE COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT FUJIFILM Corporation (JP) 2009-11-11 EP disclosed
US-20030129504-A1 Photosensitive resin compositon, transfer material, image forming method, color filter and producing method thereof and photomask and producing method thereof FUJI PHOTO FILM CO., LTD. 2003-07-10 US disclosed
EP-0104863-B1 LIGHT-SENSITIVE PLANOGRAPHIC PRINTING PLATE FUJI PHOTO FILM CO., LTD. (JP) 1989-05-03 EP disclosed