Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 5/20 | 0.44 |
| ▸ | RAB9A | P51151 | 5/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.44 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.44 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.44 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.44 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3863419 | 1.00 | NPC1 (0.44) | NPC1RAB9ASMN1; SMN2PDK1PDK2 | |
| Hydrochloric Acid SCHEMBL237195 | 0.98 | NPC1 (0.42) | NPC1RAB9ASMN1; SMN2PDK1PDK2 | |
| SCHEMBL22462283 | 0.98 | NPC1 (0.42) | NPC1RAB9ASMN1; SMN2PDK1PDK2 | |
| Hydrochloric Acid SCHEMBL19809927 | 0.98 | NPC1 (0.42) | NPC1RAB9ASMN1; SMN2PDK1PDK2 | |
| Hydrochloric Acid SCHEMBL1487338 | 0.98 | NPC1 (0.42) | NPC1RAB9ASMN1; SMN2PDK1PDK2 | |
| Hydrochloric Acid SCHEMBL21192546 | 0.96 | NPC1 (0.41) | NPC1RAB9ASMN1; SMN2PDK1PDK2 | |
| SCHEMBL5349175 | 0.88 | SMN1; SMN2 (0.36) | NPC1RAB9ASMN1; SMN2PDK1PDK2 | |
| SCHEMBL3861642 | 0.83 | MAPT (0.44) | NPC1RAB9AALDH1A1TSHRMEN1 | |
| SCHEMBL3861649 | 0.83 | MAPT (0.44) | NPC1RAB9AALDH1A1TSHRMEN1 | |
| Hydrochloric Acid SCHEMBL3893006 | 0.81 | MAPT (0.42) | NPC1RAB9AALDH1A1TSHRMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3569634-B1 | CURABLE UNSATURATED CRYSTALLINE POLYESTER POWDER AND METHODS OF MAKING THE SAME | XEROX CORP (US) | 2023-04-19 | — | — | EP | claimed |
| EP-0767212-B1 | PROCESS FOR PRODUCING AN AQUEOUS SOLUTION OF PHOSPHORYLCHOLINE GROUP BEARING POLYMER AND AQUEOUS SOLUTION OF PHOSPHORYLCHOLINE GROUP BEARING POLYMER | NOF CORP (JP) | 2001-07-18 | — | — | EP | claimed |
| WO-2024019091-A1 | WATER-ABSORBING RESIN PARTICLES AND ABSORBENT ARTICLE | 住友精化株式会社 | 2024-01-25 | — | — | WO | disclosed |
| US-20230295457-A1 | SURFACE TREATMENT LIQUID AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230272143-A1 | SURFACE TREATMENT LIQUID AND HYDROPHILIZING TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| EP-3357935-B1 | PROCESS FOR PRODUCING WATER-ABSORBENT RESIN | SUMITOMO SEIKA CHEMICALS (JP) | 2023-07-19 | — | — | EP | disclosed |
| US-20220267495-A1 | POLYMERIZABLE COMPOSITION AND HYDROPHILIZING TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-25 | — | — | US | disclosed |
| EP-2998325-B2 | WATER-ABSORBENT RESIN AND ABSORBENT ARTICLE | SUMITOMO SEIKA CHEMICALS (JP) | 2020-11-04 | — | — | EP | disclosed |
| US-10065173-B2 | Process for producing water-absorbent resin | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| EP-3357935-A1 | PROCESS FOR PRODUCING WATER-ABSORBENT RESIN | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2018-08-08 | — | — | EP | disclosed |
| EP-2993189-B1 | METHOD FOR PRODUCING WATER-ABSORBENT RESIN | SUMITOMO SEIKA CHEMICALS (JP) | 2018-04-04 | — | — | EP | disclosed |
| EP-0876888-A1 | METHOD OF PRODUCTION OF WATER-ABSORBING RESIN | Nippon Shokubai Co., Ltd. (JP) | 1998-11-11 | — | — | EP | disclosed |
| EP-0737899-A1 | ELECTROPHOTOGRAPHIC TONER AND REINFORCEMENT THEREFOR | Kao Corporation (JP) | 1996-10-16 | — | — | EP | disclosed |
| EP-0531580-B1 | Dye-donor element for use according to thermal dye sublimation transfer | AGFA GEVAERT NV (BE) | 1996-08-07 | — | — | EP | disclosed |
| EP-0324529-B1 | Resinous microparticles useful in powdery toner for electrophotography | NIPPON PAINT CO LTD (JP) | 1996-05-15 | — | — | EP | disclosed |
| EP-0643336-A2 | Binder resin for toner and positively chargeable toner containing the same | KAO CORPORATION (JP) | 1995-03-15 | — | — | EP | disclosed |
| US-5308736-A | Dye-donor element for use according to thermal dye sublimation transfer | AGFA-GEVAERT, N.V. (BE) | 1994-05-03 | — | — | US | disclosed |
| EP-0531580-A1 | Dye-donor element for use according to thermal dye sublimation transfer | AGFA-GEVAERT N.V. (BE) | 1993-03-17 | — | — | EP | disclosed |
| US-4968576-A | POSITIVE CHARGING ABILITY, IMPROVED FLOWABILITY | NIPPON PAINT CO., LTD. (JP) | 1990-11-06 | — | — | US | disclosed |
| EP-0324529-A2 | Resinous microparticles useful in powdery toner for electrophotography | Nippon Paint Co., Ltd. (JP) | 1989-07-19 | — | — | EP | disclosed |