Succinamide

Succinamide

SCHEMBL3864516

C=O.NC(=O)CCC(N)=O

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.44
ALOX15 P16050 3/20 0.44
BLM P54132 3/20 0.44
PMP22 Q01453 3/20 0.44
ALDH1A1 P00352 3/20 0.44
TDP1 Q9NUW8 3/20 0.44
TP53 P04637 2/20 0.44
CYP1A2 P05177 2/20 0.44
CYP3A4 P08684 2/20 0.44
CYP2C19 P33261 2/20 0.44
KDM4E B2RXH2 2/20 0.44
GMNN O75496 1/20 0.44
USP2 O75604 1/20 0.44
GLA P06280 1/20 0.44
POLB P06746 1/20 0.44
CYP2C9 P11712 1/20 0.44
HPGD P15428 1/20 0.44
THPO P40225 1/20 0.44
RECQL P46063 1/20 0.44
HSD17B10 Q99714 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Succinamide SCHEMBL36057 0.91
Succinamide SCHEMBL29269227 0.87
Succinamide SCHEMBL28836984 0.87
Succinamide SCHEMBL30513314 0.87 LMNA (0.47) LMNAALOX15BLMPMP22ALDH1A1
Succinamide SCHEMBL29631488 0.87
Succinamide SCHEMBL28650219 0.87
Succinamide SCHEMBL11662331 0.87
Succinamide SCHEMBL1647263 0.87 LMNA (0.47) LMNAALOX15BLMPMP22ALDH1A1
Succinamide SCHEMBL21530847 0.87 LMNA (0.47) LMNAALOX15BLMPMP22ALDH1A1
Succinamide SCHEMBL3244170 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 159 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1208187-C Casting mould for producing ceramic green-pressing sheet LINTEC CO LTD (JP) 2005-06-29 CN claimed
CN-112041739-B Liquid crystal light modulation element 日产化学株式会社 2024-06-11 CN disclosed
CN-117916082-A Laminate and method for producing laminate 富士胶片株式会社 2024-04-19 CN disclosed
CN-107689333-B Semiconductor package and method of forming the same 台湾积体电路制造股份有限公司 2023-11-21 CN disclosed
CN-110036343-B Water-soluble composition, pattern forming agent, method for producing cured product using same, and cured product 株式会社ADEKA 2023-06-13 CN disclosed
EP-2980058-B1 COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND TOKYO OHKA KOGYO CO LTD (JP) 2023-05-03 EP disclosed
CN-115746874-A Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学工业株式会社 2023-03-07 CN disclosed
CN-111217946-B Composition comprising a compound containing a vinyl group 东京应化工业株式会社 2022-12-06 CN disclosed
CN-110462501-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学株式会社 2022-10-28 CN disclosed
CN-110023826-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学株式会社 2022-10-25 CN disclosed
US-7063934-B2 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same TOYKO OHKA KOGYO CO., LTD. (JP) 2006-06-20 US disclosed
US-20060035170-A1 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same SAITO KOJI 2006-02-16 US disclosed
US-20060035169-A1 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same TOKYO OHKA KOGYO CO., LTD. 2006-02-16 US disclosed
CN-1208187-C Casting mould for producing ceramic green-pressing sheet LINTEC CO LTD (JP) 2005-06-29 CN disclosed
CN-1584631-A Dye-containing resist composition and color filter using same NISSAN CHEMICAL IND LTD (JP) 2005-02-23 CN disclosed
US-6838229-B2 Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2005-01-04 US disclosed
US-20030064319-A1 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same TOKYO OHKA KOGYO CO., LTD. 2003-04-03 US disclosed
US-20030039921-A1 Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same TOKYO OHKA KOGYO CO., LTD. 2003-02-27 US disclosed
CN-1332083-A Casting mould for producing ceramic green-pressing sheet LINTEC CO LTD (JP) 2002-01-23 CN disclosed
US-5700625-A Negative-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-12-23 US disclosed