SCHEMBL3864537

SCHEMBL3864537

CC(C)(/N=N/C(C)(C)C(=N)NCCO)C(=N)NCCO

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.36
CYP3A4 P08684 1/20 0.36
MAPT P10636 1/20 0.36
CYP2D6 P10635 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3864539 1.00 ALDH1A1 (0.36) ALDH1A1CYP3A4MAPTCYP2D6
Water SCHEMBL31024411 0.98 ALDH1A1 (0.34) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL4207271 0.98 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
Water SCHEMBL30525491 0.98 ALDH1A1 (0.34) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL1487320 0.98 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL306250 0.98 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL5354801 0.84
Hydrochloric Acid SCHEMBL10782216 0.80 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL10782209 0.80 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL24634251 0.78 MEN1 (0.32) ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3569634-B1 CURABLE UNSATURATED CRYSTALLINE POLYESTER POWDER AND METHODS OF MAKING THE SAME XEROX CORP (US) 2023-04-19 EP claimed
EP-0767212-B1 PROCESS FOR PRODUCING AN AQUEOUS SOLUTION OF PHOSPHORYLCHOLINE GROUP BEARING POLYMER AND AQUEOUS SOLUTION OF PHOSPHORYLCHOLINE GROUP BEARING POLYMER NOF CORP (JP) 2001-07-18 EP claimed
WO-2024019091-A1 WATER-ABSORBING RESIN PARTICLES AND ABSORBENT ARTICLE 住友精化株式会社 2024-01-25 WO disclosed
EP-3357935-B1 PROCESS FOR PRODUCING WATER-ABSORBENT RESIN SUMITOMO SEIKA CHEMICALS (JP) 2023-07-19 EP disclosed
WO-2023058694-A1 INFRARED ABSORBING FIBER AND FIBER PRODUCT 住友金属鉱山株式会社 2023-04-13 WO disclosed
WO-2022219808-A1 INFRARED ABSORBING FIBER AND FIBER PRODUCT 住友金属鉱山株式会社 2022-10-20 WO disclosed
US-20220267495-A1 POLYMERIZABLE COMPOSITION AND HYDROPHILIZING TREATMENT METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2022-08-25 US disclosed
US-20220228012-A1 ANTI-COUNTERFEIT INK COMPOSITION, ANTI-COUNTERFEIT INK, AND ANTI-COUNTERFEIT PRINTED PRODUCT SUMITOMO METAL MINING CO., LTD. (JP) 2022-07-21 US disclosed
EP-3981604-A1 ANTI-COUNTERFEIT INK COMPOSITION, ANTI-COUNTERFEIT INK AND ANTI-COUNTERFEIT PRINTED MATTER SUMITOMO METAL MINING CO., LTD. (JP) 2022-04-13 EP disclosed
EP-2998325-B2 WATER-ABSORBENT RESIN AND ABSORBENT ARTICLE SUMITOMO SEIKA CHEMICALS (JP) 2020-11-04 EP disclosed
WO-2020129919-A1 ORGANIC-INORGANIC HYBRID INFRARED BEAM ABSORBING PARTICLE PRODUCTION METHOD AND ORGANIC-INORGANIC HYBRID INFRARED BEAM ABSORBING PARTICLE 住友金属鉱山株式会社 2020-06-25 WO disclosed
US-5342725-A Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1994-08-30 US disclosed
EP-0599660-A1 Process of producing nonaqueous resin dispersion and liguid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1994-06-01 EP disclosed
US-5308736-A Dye-donor element for use according to thermal dye sublimation transfer AGFA-GEVAERT, N.V. (BE) 1994-05-03 US disclosed
EP-0531580-A1 Dye-donor element for use according to thermal dye sublimation transfer AGFA-GEVAERT N.V. (BE) 1993-03-17 EP disclosed
US-5085966-A Graft polymer made from macromonomer having terminal polymerizable group, storage stable FUJI PHOTO FILM CO., LTD. (JP) 1992-02-04 US disclosed
US-5073471-A Comprising dispersed resin grains of an acrylic polymer of an unsaturated ester, an acrylic stabilizer and an oligomer; antisoilants; antisticking agents FUJI PHOTO FILM CO., LTD. (JP) 1991-12-17 US disclosed
US-5073470-A Resin grains of monofunctial monomer polymerized with macromonomer having one terminal double bond, dispersion stabilizing resin FUJI PHOTO FILM CO., LTD. (JP) 1991-12-17 US disclosed
US-5041352-A Dispersion stability, ink receptivity FUJI PHOTO FILM CO., LTD. (JP) 1991-08-20 US disclosed
US-4977055-A RESIN DISPESEDIN NONAQUEOUS SOLVENT FUJI PHOTO FILM CO., LTD. (JP) 1990-12-11 US disclosed