SCHEMBL3865083

SCHEMBL3865083

Nc1ccc(-c2ccc(-c3ccc(N)c(C(=O)O)c3)cc2)cc1C(=O)O

nearest known ligand 0.95

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.95
KDM4E B2RXH2 2/20 0.95
GFER P55789 1/20 0.95
RXFP1 Q9HBX9 1/20 0.95
IKBKB O14920 1/20 0.66
MCL1 Q07820 5/20 0.63
MEN1 O00255 1/20 0.63
USP2 O75604 1/20 0.63
POLB P06746 1/20 0.63
MAPT P10636 1/20 0.63
THRB P10828 1/20 0.63
PKM P14618 1/20 0.63
APEX1 P27695 1/20 0.63
RECQL P46063 1/20 0.63
BLM P54132 1/20 0.63
TDP1 Q9NUW8 1/20 0.63
GLA P06280 1/20 0.61
KEAP1 Q14145 1/20 0.61
ALDH1A1 P00352 1/20 0.59
CDC25B P30305 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1954450 0.98 KMT2A (1.00) KMT2AKDM4EGFERRXFP1IKBKB
SCHEMBL352643 0.98 KMT2A (1.00) KMT2AKDM4EGFERRXFP1IKBKB
SCHEMBL29498389 0.98 KMT2A (1.00) KMT2AKDM4EGFERRXFP1IKBKB
Hydrochloric Acid SCHEMBL8024368 0.95 KMT2A (0.95) KMT2AKDM4EGFERRXFP1IKBKB
Ammonia Solution, Strong SCHEMBL5271744 0.95 KMT2A (0.95) KMT2AKDM4EGFERRXFP1IKBKB
Water SCHEMBL28033099 0.95 KMT2A (0.95) KMT2AKDM4EGFERRXFP1IKBKB
Methane SCHEMBL29001097 0.95 KMT2A (0.95) KMT2AKDM4EGFERRXFP1IKBKB
SCHEMBL30030661 0.94 KDM4E (0.84) KMT2AKDM4EGFERRXFP1IKBKB
SCHEMBL1708790 0.94 KDM4E (0.84) KMT2AKDM4EGFERRXFP1IKBKB
SCHEMBL2246915 0.94 KMT2A (0.84) KMT2AKDM4EGFERRXFP1IKBKB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1666972-B1 USE OF A COMPOSITION CONTAINING POLYAMIC ACID FOR FORMING AN ANTI-REFLECTIVE COATING NISSAN CHEMICAL IND LTD (JP) 2013-03-27 EP disclosed
US-7598182-B2 having monomers of pyromellitic acid, 3,5-diaminobenzoic acid; use in a lithography for forming photoresist pattern NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-10-06 US disclosed
US-20070004228-A1 Polyamide acid-containing composition for forming antireflective film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-01-04 US disclosed
EP-1666972-A1 POLYAMIDE ACID-CONTAINING COMPOSITION FOR FORMING ANTIREFLECTIVE FILM Nissan Chemical Industries, Ltd. (JP) 2006-06-07 EP disclosed