Ethylene

Ethylene

SCHEMBL3866924

C=C.CCCCCOCCCCC

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.59
HTT P42858 2/20 0.59
MEN1 O00255 1/20 0.59
KMT2A Q03164 1/20 0.59
MAPT P10636 1/20 0.59
TSHR P16473 3/20 0.52
CES2 O00748 2/20 0.48
ALDH1A1 P00352 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
USP2 O75604 1/20 0.44
CYP3A4 P08684 1/20 0.44
CES1 P23141 1/20 0.43
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
CA9 Q16790 2/20 0.40
CA12 O43570 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL7784027 1.00 THRB (0.59) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL3883865 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL17731208 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL11125821 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL23499847 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL23499835 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL493128 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL23499818 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL14990393 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT
Ethylene SCHEMBL15511914 0.97 THRB (0.64) THRBHTTMEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2009020710-A2 TRANSIENTLY BONDING DRAG-TAGS FOR SEPARATION MODALITIES CARNEGIE MELLON UNIVERSITY (US) 2009-02-12 WO claimed
CN-109943236-A The manufacturing method of composition for polishing, the manufacturing method of composition for polishing and composition for polishing stoste 福吉米株式会社 2019-06-28 CN disclosed
CN-106233424-B Silicon Wafer composition for polishing 福吉米株式会社 2018-12-25 CN disclosed
CN-106663619-A Composition for polishing silicon wafers 福吉米株式会社 2017-05-10 CN disclosed
CN-106233423-A composition for polishing silicon wafer 福吉米株式会社 2016-12-14 CN disclosed
CN-106233424-A Silicon Wafer composition for polishing 福吉米株式会社 2016-12-14 CN disclosed
CN-100375738-C Preparation method of Polyvinyl ether compound IDEMITSU KOSAN CO (JP) 2008-03-19 CN disclosed
CN-100343215-C Polyvinyl ether compound and lubricating oil IDEMITSU KOSAN CO (JP) 2007-10-17 CN disclosed
CN-1991584-A Light solidification pigmentation composition and color filter, and liquid crystal display device FUJI FILM ELECTRONIC MATERIAL (JP) 2007-07-04 CN disclosed
CN-1234741-C Polyvinyl ether compound and lubricating oil IDEMITSU KOSAN CO (JP) 2006-01-04 CN disclosed
CN-1234737-C Polyvinyl ether compound and lubricating oil IDEMITSU KOSAN CO (JP) 2006-01-04 CN disclosed
CN-1081645-C Polyvinyl ether compound IDEMITSU KOSAN CO (JP) 2002-03-27 CN disclosed
CN-1314419-A Polyvinyl ether compound IDEMITSU KOSAN CO (JP) 2001-09-26 CN disclosed
CN-1233622-A Polyvinyl ether compound and lubricating oil IDEMITSU KOSAN CO (JP) 1999-11-03 CN disclosed
CN-1233621-A Polyvinyl ether compound and lubricating oil IDEMITSU KOSAN CO (JP) 1999-11-03 CN disclosed
CN-1233620-A Polyvinyl ether compound and lubricating oil IDEMITSU KOSAN CO (JP) 1999-11-03 CN disclosed
CN-1080296-A polyvinyl ether compound and lubricating oil IDEMITSU KOSAN CO (JP) 1994-01-05 CN disclosed