SCHEMBL3871197

SCHEMBL3871197

C1CCC(C2CC3CCC2C3)CC1

nearest known ligand 0.37

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.37
MEN1 O00255 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
KMT2A Q03164 1/20 0.35
ALDH1A1 P00352 1/20 0.35
HSD11B1 P28845 2/20 0.32
LMNA P02545 1/20 0.31
HPGD P15428 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HSD11B2 P80365 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL384421 0.97 ALDH1A1 (0.37) EPHX1MEN1NPC1RAB9AKMT2A
SCHEMBL30799838 0.89 POLB (0.33) MEN1KMT2A
SCHEMBL29625476 0.80
SCHEMBL31023397 0.80 EPHX1 (0.32) EPHX1MEN1NPC1RAB9AKMT2A
SCHEMBL3000801 0.78
SCHEMBL29758999 0.78 ALDH1A1 (0.32) EPHX1ALDH1A1
SCHEMBL31407003 0.77
SCHEMBL2013044 0.77 ALDH1A1 (0.35) ALDH1A1
SCHEMBL21731869 0.77 POLB (0.34)
SCHEMBL29825567 0.77 TSHR (0.32) EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117776939-A Diamine containing cyclohexane and norbornane structure, preparation method and application thereof in preparation of transparent nylon 万华化学集团股份有限公司 2024-03-29 CN claimed
CN-117776939-A Diamine containing cyclohexane and norbornane structure, preparation method and application thereof in preparation of transparent nylon 万华化学集团股份有限公司 2024-03-29 CN disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
EP-1735286-A1 TETRAHYDRO-INDAZOLE CANNABINOID MODULATORS JANSSEN PHARMACEUTICA N.V. (BE) 2006-12-27 EP disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
WO-2005095353-A1 TETRAHYDRO-INDAZOLE CANNABINOID MODULATORS JANSSEN PHARMACEUTICA, N.V. (BE) 2005-10-13 WO disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed
CN-1125836-C copolymer for chemically amplified resist SAMSUNG ELECTRONICS CO LTD (KR) 2003-10-29 CN disclosed
CN-1224728-A Photosensitive polymer and chemically amplified resist composition thereof SAMSUNG ELECTRONICS CO LTD (KR) 1999-08-04 CN disclosed