SCHEMBL387131

SCHEMBL387131

[Al+3].[N-]=C=O.[N-]=C=O.[N-]=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL388403 0.86
SCHEMBL2142197 0.86
SCHEMBL11879355 0.86
Zinc Ion SCHEMBL7036211 0.86
Potassium Ion SCHEMBL75950 0.86
SCHEMBL2367693 0.86
Potassium Ion SCHEMBL1325711 0.86
SCHEMBL1083149 0.86
SCHEMBL5480491 0.86
SCHEMBL6809796 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1895576-B1 PATTERN FORMING METHOD TOKYO OHKA KOGYO CO LTD (JP) 2014-07-23 EP claimed
US-7932013-B2 Pattern coating material and pattern forming method TOKYO OHKA KOGYO CO., LTD. (JP) 2011-04-26 US claimed
CN-113423664-B Chelation of crystalline silica 夸兹沃克公司 2024-07-23 CN disclosed
EP-3275527-B1 GAS-PERMEABLE MEMBRANE, USE OF A COMPOSITION FOR FORMING SUCH MEMBRANE AND PROCESS FOR PRODUCING IT NANOMEMBRANE TECH INC (JP) 2023-10-11 EP disclosed
US-10751672-B2 Gas-permeable membrane NanoMembrane Technologies, Inc. (JP) 2020-08-25 US disclosed
EP-3275527-A1 GAS-PERMEABLE MEMBRANE NanoMembrane Technologies, Inc. (JP) 2018-01-31 EP disclosed
US-20180021738-A1 GAS-PERMEABLE MEMBRANE NanoMembrane Technologies, Inc. (JP) 2018-01-25 US disclosed
EP-2131423-B1 NEGATIVE ELECTRODE BASE MEMBER TOKYO OHKA KOGYO CO LTD (JP) 2017-11-15 EP disclosed
US-9796879-B2 Film-forming material TOKYO OHKA KOGYO CO., LTD. (JP) 2017-10-24 US disclosed
US-9405199-B2 Method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-08-02 US disclosed
US-9105929-B2 Negative electrode base member TOKYO OHKA KOGYO CO., LTD. (JP) 2015-08-11 US disclosed
EP-0168824-A2 Antifoulants for thermal cracking processes PHILLIPS PETROLEUM COMPANY (US) 1986-01-22 EP disclosed
US-4545893-A TREATING METAL EQUIPMENT WITH METAL OR METAL COMPOUNDS OF ALUMINUM, ANTIMONY AND/OR TIN TO PREVENT COKING PHILLIPS PETROLEUM COMPANY (US) 1985-10-08 US disclosed
US-4518773-A \"3-Carbamoyloxy cephalosporins\ BRISTOL-MYERS COMPANY (US) 1985-05-21 US disclosed
US-4501790-A Fiber-reinforced urethane molding provided with coating films MAZDA MOTOR CORPORATION (JP) 1985-02-26 US disclosed
US-4426520-A CEPHALOSPORIN ANTIBIOTICS BRISTOL-MYERS COMPANY (US) 1984-01-17 US disclosed
US-4407755-A BACTERICIDAL PENICILLINS BRISTOL-MYERS COMPANY (US) 1983-10-04 US disclosed
US-4374982-A Cepham compounds BRISTOL-MYERS COMPANY (US) 1983-02-22 US disclosed
US-4322347-A 2-Carbamoyloxymethyl-penicillin derivatives BRISTOL-MYERS COMPANY (US) 1982-03-30 US disclosed
US-4310459-A Process for producing carbamoyl substituted penams and carbamoyl substituted cephams from penicillin sulfoxide esters BRISTOL-MYERS COMPANY (US) 1982-01-12 US disclosed