⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11879355 | 0.86 | — | — | |
| SCHEMBL2142197 | 0.86 | — | — | |
| SCHEMBL2367693 | 0.86 | — | — | |
| SCHEMBL5480491 | 0.86 | — | — | |
| Potassium Ion SCHEMBL75950 | 0.86 | — | — | |
| SCHEMBL387131 | 0.86 | — | — | |
| SCHEMBL1083149 | 0.86 | — | — | |
| Potassium Ion SCHEMBL1325711 | 0.86 | — | — | |
| Zinc Ion SCHEMBL7036211 | 0.86 | — | — | |
| SCHEMBL343649 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1895576-B1 | PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2014-07-23 | — | — | EP | claimed |
| US-7932013-B2 | Pattern coating material and pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-26 | — | — | US | claimed |
| CN-120134737-A | Resin sheet with metal foil | 味之素株式会社 | 2025-06-13 | — | — | CN | disclosed |
| EP-3275527-B1 | GAS-PERMEABLE MEMBRANE, USE OF A COMPOSITION FOR FORMING SUCH MEMBRANE AND PROCESS FOR PRODUCING IT | NANOMEMBRANE TECH INC (JP) | 2023-10-11 | — | — | EP | disclosed |
| US-10751672-B2 | Gas-permeable membrane | NanoMembrane Technologies, Inc. (JP) | 2020-08-25 | — | — | US | disclosed |
| EP-3275527-A1 | GAS-PERMEABLE MEMBRANE | NanoMembrane Technologies, Inc. (JP) | 2018-01-31 | — | — | EP | disclosed |
| US-20180021738-A1 | GAS-PERMEABLE MEMBRANE | NanoMembrane Technologies, Inc. (JP) | 2018-01-25 | — | — | US | disclosed |
| EP-2131423-B1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-9796879-B2 | Film-forming material | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-24 | — | — | US | disclosed |
| US-9405199-B2 | Method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9105929-B2 | Negative electrode base member | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20090286936-A1 | COMPOSITION FOR FORMATION OF MOLD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090134119-A1 | FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090087625-A1 | METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090061170-A1 | ANISOTROPIC FILM AND METHOD OF MANUFACTURING ANISOTROPIC FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090029284-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| EP-1895576-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-05 | — | — | EP | disclosed |
| US-20080050564-A1 | Method of Forming a Nano-Structure and the Nano-Structure | RIKEN (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20070126147-A1 | Method of producing a nanomaterial, and a nanomaterial | RIKEN (JP) | 2007-06-07 | — | — | US | disclosed |
| EP-1767491-A1 | METHOD FOR MANUFACTURING NANOSTRUCTURE AND NANOSTRUCTURE | Riken (JP) | 2007-03-28 | — | — | EP | disclosed |