Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 8/20 | 0.58 |
| ▸ | MEN1 | O00255 | 7/20 | 0.58 |
| ▸ | GAA | P10253 | 3/20 | 0.58 |
| ▸ | ESR1 | P03372 | 2/20 | 0.58 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.58 |
| ▸ | LMNA | P02545 | 3/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.43 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | MAPT | P10636 | 4/20 | 0.41 |
| ▸ | GFER | P55789 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.40 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | VDR | P11473 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | HTR6 | P50406 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6942534 | 0.88 | KMT2A (0.71) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL6935953 | 0.82 | KMT2A (0.64) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL2066156 | 0.81 | KMT2A (0.59) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL13924690 | 0.81 | KMT2A (0.59) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL4076148 | 0.81 | KMT2A (0.59) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL4081984 | 0.80 | KMT2A (0.58) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL482651 | 0.80 | KMT2A (0.62) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL3811146 | 0.79 | KMT2A (0.61) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL4076149 | 0.79 | KMT2A (0.60) | KMT2AMEN1GAAESR1ESR2 | |
| SCHEMBL6740051 | 0.79 | KMT2A (0.53) | KMT2AMEN1GAAESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090221845-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7550545-B2 | Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-06-23 | — | — | US | disclosed |
| US-7498393-B2 | Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-03-03 | — | — | US | disclosed |
| EP-1365290-B1 | RESIST COMPOSITION | ASAHI GLASS CO LTD (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-09-06 | — | — | US | disclosed |
| EP-1343047-B1 | Resist composition | ASAHI GLASS CO LTD (JP) | 2007-07-25 | — | — | EP | disclosed |
| US-7244545-B2 | Fluorinated compound, fluoropolymer and process for its production | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-07-17 | — | — | US | disclosed |
| US-20070154844-A1 | FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-07-05 | — | — | US | disclosed |
| US-20070083021-A1 | Fluorocopolymer, method for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1772468-A1 | FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, RESIST COMPOSITION AND RESIST PROTECTIVE FILM COMPOSITION | Asahi Glass Company, Limited (JP) | 2007-04-11 | — | — | EP | disclosed |
| US-6818258-B2 | ACID GENERATOR AND A FLUOROPOLYMER FORMED BY CYCLOPOLYMERIZING A FLUORINATED DIENE MONOMER HAVING BLOCKED ACIDIC GROUPS | ASAHI GLASS COMPANY, LIMITED (JP) | 2004-11-16 | — | — | US | disclosed |
| US-6815146-B2 | Resist composition | ASAHI GLASS COMPANY, LIMITED (JP) | 2004-11-09 | — | — | US | disclosed |
| EP-1441256-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2004-07-28 | — | — | EP | disclosed |
| US-6727032-B1 | USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. | JSR CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20040033439-A1 | Resist composition | ASAHI GLASS COMPANY LIMITED (JP) | 2004-02-19 | — | — | US | disclosed |
| US-6692887-B1 | COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY | JSR CORPORATION (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20040013970-A1 | Resist composition | ASAHI GLASS COMPANY, LIMITED (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1365290-A1 | RESIST COMPOSITION | ASAHI GLASS COMPANY LTD. (JP) | 2003-11-26 | — | — | EP | disclosed |
| EP-1343047-A2 | Resist composition | ASAHI GLASS COMPANY LTD. (JP) | 2003-09-10 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090221845-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | AFF4, AFF1, Q6ZSR9 | KMT2A 714/4885MEN1 1688/4885GAA 4728/4885 |
| US-20070154844-A1 | FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM | AFF1, AFF4, AFF2 | KMT2A 2065/4885MEN1 502/4885GAA 4815/4885 |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | AFF4, AFF1, Q6ZSR9 | KMT2A 714/4885MEN1 1688/4885GAA 4728/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.