Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.57 |
| ▸ | CES2 | O00748 | 1/20 | 0.57 |
| ▸ | CES1 | P23141 | 1/20 | 0.57 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | HPGD | P15428 | 3/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.45 |
| ▸ | ERCC5 | P28715 | 1/20 | 0.44 |
| ▸ | FEN1 | P39748 | 1/20 | 0.44 |
| ▸ | SRC | P12931 | 1/20 | 0.43 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.42 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.42 |
| ▸ | MYC | P01106 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methoxymethane SCHEMBL10694992 | 0.95 | LMNA (0.52) | LMNACES2CES1MAPK1KDM4E | |
| Formic Acid SCHEMBL160514 | 0.93 | LMNA (0.50) | LMNACES2CES1MAPK1KDM4E | |
| Benzoin SCHEMBL9350257 | 0.93 | LMNA (0.70) | LMNACES2CES1MAPK1KDM4E | |
| Benzoic Acid SCHEMBL632179 | 0.92 | LMNA (0.58) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL11139908 | 0.90 | LMNA (0.47) | LMNACES2CES1MAPK1KDM4E | |
| Ether SCHEMBL21065806 | 0.89 | LMNA (0.46) | LMNACES2CES1MAPK1KDM4E | |
| Benzoin SCHEMBL28256437 | 0.89 | LMNA (0.64) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL6916226 | 0.89 | LMNA (0.46) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL1487887 | 0.87 | LMNA (0.52) | LMNACES2CES1MAPK1KDM4E | |
| SCHEMBL28887353 | 0.86 | LMNA (0.50) | LMNACES2CES1MAPK1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2757 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119306642-B | Method for synthesizing thioacetamide derivative and 2-methylbenzomide/oxa/thiazole and derivatives thereof | 内蒙古工业大学 | 2025-04-08 | — | — | CN | claimed |
| CN-119505116-A | Composition of photopolymerisable controlled distribution block polymer, preparation method and application thereof | 中国石油化工股份有限公司 | 2025-02-25 | — | — | CN | claimed |
| CN-119306642-A | Method for synthesizing thioacetamide derivative and 2-methylbenzomide/oxa/thiazole and derivatives thereof | 内蒙古工业大学 | 2025-01-14 | — | — | CN | claimed |
| CN-118580822-A | Insulating protection method for slurry, polyimide adhesive film and power battery pack cold plate with insulating protection film | 比亚迪股份有限公司 | 2024-09-03 | — | — | CN | claimed |
| US-20240141091-A1 | Block Copolymer Composition And Methods Of Preparation Thereof | Kraton Corporation (US) | 2024-05-02 | — | — | US | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-107077068-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board | 昭和电工材料株式会社 | 2021-03-12 | — | — | CN | claimed |
| US-10005915-B2 | High-stretch energy curable inks and method of use in heat transfer label applications | SUN CHEMICAL CORPORATION (US) | 2018-06-26 | — | — | US | claimed |
| EP-3257677-A1 | INKS OR COATINGS AND METHOD OF USE IN HEAT TRANSFER LABEL APPLICATIONS | Sun Chemical Corporation (US) | 2017-12-20 | — | — | EP | claimed |
| US-20020132180-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-19 | — | — | US | claimed |
| US-6245711-B1 | Thermal paper with security features | NCR CORPORATION | 2001-06-12 | — | — | US | claimed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| US-5350790-A | Aromatic carboxylic acid | MITSUBISHI KASEI CORPORATION (JP) | 1994-09-27 | — | — | US | claimed |
| EP-0364792-B1 | CARRIER FOR DYEING POLYESTER MATERIALS | BAYER AG (DE) | 1993-02-03 | — | — | EP | claimed |
| US-5179067-A | Benzoin derivative sensitizer | CHONJU PAPER MFG. CO., LTD. (KR) | 1993-01-12 | — | — | US | claimed |
| US-4994089-A | Synergistic | BAYER AKTIENGESELLSCHAFT (DE) | 1991-02-19 | — | — | US | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |
| US-3990958-A | Radiation polymerization of triallylamines using a non-polar, non-hydroxylic solvent | ICI AUSTRALIA LIMITED (AU) | 1976-11-09 | — | — | US | claimed |