SCHEMBL3873682

SCHEMBL3873682

CCCCCCOC(C)C(O)CO

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
USP2 O75604 1/20 0.48
SPHK1 Q9NYA1 3/20 0.43
DNM1 Q05193 1/20 0.42
ALDH1A1 P00352 1/20 0.42
CNR1 P21554 1/20 0.42
CNR2 P34972 1/20 0.42
HTT P42858 3/20 0.41
CYP2D6 P10635 2/20 0.41
MAPT P10636 2/20 0.41
LMNA P02545 2/20 0.41
GMNN O75496 1/20 0.41
POLB P06746 1/20 0.41
THPO P40225 1/20 0.41
MTOR P42345 1/20 0.41
BLM P54132 1/20 0.41
KDM4E B2RXH2 1/20 0.41
TP53 P04637 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CETP P11597 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2545522 1.00 USP2 (0.48) USP2SPHK1DNM1ALDH1A1CNR1
SCHEMBL25421947 1.00 USP2 (0.48) USP2SPHK1DNM1ALDH1A1CNR1
SCHEMBL11981865 0.92 USP2 (0.38) USP2SPHK1ALDH1A1CNR1CNR2
SCHEMBL11981862 0.92 USP2 (0.38) USP2SPHK1ALDH1A1CNR1CNR2
SCHEMBL11981859 0.92 USP2 (0.38) USP2SPHK1ALDH1A1CNR1CNR2
SCHEMBL11981857 0.92 USP2 (0.38) USP2SPHK1ALDH1A1CNR1CNR2
SCHEMBL28002018 0.83 SPHK1 (0.42) USP2SPHK1DNM1ALDH1A1CNR1
SCHEMBL1944097 0.82 DNM1 (0.55) USP2SPHK1DNM1ALDH1A1HTT
SCHEMBL20788845 0.82 USP2 (0.50) USP2SPHK1DNM1ALDH1A1CNR1
SCHEMBL20788838 0.82 USP2 (0.50) USP2SPHK1DNM1ALDH1A1CNR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220183960-A1 DEODORANT COMPOSITIONS G&S LABORATORIES INC (US) 2022-06-16 US claimed
CN-111840143-A Non-stick lipstick 广州莎莎生物科技有限公司 2020-10-30 CN claimed
CN-108587324-A Printing ink composition 精工爱普生株式会社 2018-09-28 CN claimed
CN-107998068-A A kind of skin shin moisturizer and preparation method thereof 柳州市汉象教育咨询有限责任公司 2018-05-08 CN claimed
CN-110974716-B Composition for preventing and treating striae gravidarum 华熙生物科技股份有限公司 2023-02-03 CN disclosed
US-20220183960-A1 DEODORANT COMPOSITIONS G&S LABORATORIES INC (US) 2022-06-16 US disclosed
CN-110151595-B Compound composition for preventing and treating stretch marks 天津盛世永业科技发展有限公司 2022-02-11 CN disclosed
CN-111840143-A Non-stick lipstick 广州莎莎生物科技有限公司 2020-10-30 CN disclosed
CN-110974716-A Composition for preventing and treating striae gravidarum 华熙生物科技股份有限公司 2020-04-10 CN disclosed
CN-110151595-A The high efficiency composition system for preventing and treating striae of pregnancy and its application in cosmetics 天津盛世永业科技发展有限公司 2019-08-23 CN disclosed
CN-108624141-A Water-based ink for use in ink-jet recording composition and colorant liquid 精工爱普生株式会社 2018-10-09 CN disclosed
CN-108587324-A Printing ink composition 精工爱普生株式会社 2018-09-28 CN disclosed
CN-104812587-B Printing process and printed article 株式会社御牧工程 2018-06-22 CN disclosed
CN-108070279-A The pigment dispersion and coloured composition of phthalimide and its derivative are used 山阳色素株式会社 2018-05-25 CN disclosed
CN-107998068-A A kind of skin shin moisturizer and preparation method thereof 柳州市汉象教育咨询有限责任公司 2018-05-08 CN disclosed
CN-107880586-A Colorant, colored resin composition comprising the same, and color filter 乐金显示有限公司 2018-04-06 CN disclosed
WO-2016197015-A1 PERSONAL CARE PRODUCTS: KIT AND METHODS OF USE AND MAKING LONGEVA LLC (US) 2016-12-08 WO disclosed
EP-2106783-A1 Sun screen Sebapharma GmbH & Co. KG (DE) 2009-10-07 EP disclosed