SCHEMBL3874006

SCHEMBL3874006

O=S(=O)(O)C(F)(F)c1cc(F)cc(F)c1

nearest known ligand 0.53

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 2/20 0.53
CES2 O00748 1/20 0.37
CES1 P23141 1/20 0.37
CA1 P00915 2/20 0.36
CA9 Q16790 2/20 0.36
CA12 O43570 1/20 0.36
ALDH1A1 P00352 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
RXRA P19793 1/20 0.32
RXRB P28702 1/20 0.32
RXRG P48443 1/20 0.32
HSD11B1 P28845 1/20 0.32
KCNN4 O15554 1/20 0.31
CA2 P00918 1/20 0.31
CA5A P35218 1/20 0.31
ACP1 P24666 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11592132 0.87 PTPN1 (0.52) PTPN1CES2CA1CA9CA12
SCHEMBL3872116 0.80 PTPN1 (0.41) PTPN1CES2CES1CA1CA9
SCHEMBL11589919 0.79 PTPN1 (0.61) PTPN1CA1CA9HSD11B1KCNN4
SCHEMBL15760397 0.77 PTPN1 (0.44) PTPN1CA1CA9ALDH1A1L3MBTL1
SCHEMBL11589930 0.77 PTPN1 (0.58) PTPN1CES2CES1CA1CA9
Trifluoromethanesulfonic Acid SCHEMBL28703240 0.74 CA12 (0.59) PTPN1CES2CES1CA1CA9
SCHEMBL3883689 0.74 PTPN1 (0.51) PTPN1CES2CES1CA1CA9
Trifluoromethanesulfonic Acid SCHEMBL27873140 0.73 PTPN1 (0.35) PTPN1CES2CES1CA1CA9
SCHEMBL3870301 0.71 PTPN1 (0.67) PTPN1CES1CA1CA9ALDH1A1
SCHEMBL3869513 0.71 PTPN1 (0.53) PTPN1CES2CES1CA1CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed