SCHEMBL3883689

SCHEMBL3883689

O=S(=O)(O)C(F)(F)c1ccc(F)c(F)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 2/20 0.51
KCNN4 O15554 1/20 0.42
CES2 O00748 1/20 0.38
CES1 P23141 1/20 0.38
STS P08842 1/20 0.34
SLC22A12 Q96S37 1/20 0.34
CA1 P00915 4/20 0.33
CA2 P00918 4/20 0.33
CA9 Q16790 4/20 0.33
CA5A P35218 3/20 0.33
HDAC3 O15379 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
HDAC6 Q9UBN7 1/20 0.33
PDE2A O00408 1/20 0.33
CA12 O43570 1/20 0.33
KIF11 P52732 2/20 0.33
HSD11B1 P28845 1/20 0.33
SOS1 Q07889 2/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15754933 0.82 KCNN4 (0.43) PTPN1KCNN4CES2CES1SLC22A12
SCHEMBL3870998 0.81 KCNN4 (0.40) PTPN1KCNN4CES2CES1SLC22A12
SCHEMBL11589930 0.80 PTPN1 (0.58) PTPN1CES2CES1STSCA1
SCHEMBL11589919 0.77 PTPN1 (0.61) PTPN1KCNN4CA1CA2CA9
SCHEMBL11592132 0.75 PTPN1 (0.52) PTPN1CES2STSCA1CA2
SCHEMBL3869513 0.74 PTPN1 (0.53) PTPN1CES2CES1CA1CA2
SCHEMBL3874006 0.74 PTPN1 (0.53) PTPN1KCNN4CES2CES1CA1
SCHEMBL14111138 0.73 PTPN1 (0.56) PTPN1CES2CES1CA1CA2
SCHEMBL2147584 0.71 PDE2A (0.50) KCNN4CES2PDE2AKMT2A
SCHEMBL29827588 0.71 PDE2A (0.50) KCNN4CES2PDE2AKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed