SCHEMBL38745

SCHEMBL38745

[SiH3]c1ccc(Cl)c(Cl)c1Cl

nearest known ligand 0.46

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.46
MAPK1 P28482 1/20 0.46
AHR P35869 6/20 0.39
TDP1 Q9NUW8 1/20 0.37
CYP2A6 P11509 2/20 0.35
CES1 P23141 1/20 0.33
TSHR P16473 2/20 0.32
CYP1A2 P05177 1/20 0.32
NOTUM Q6P988 2/20 0.31
CYP1B1 Q16678 1/20 0.31
TP53 P04637 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL28939183 0.82 MAPK1 (0.33) CYP3A4MAPK1
SCHEMBL348089 0.79 CYP3A4 (0.62) CYP3A4MAPK1AHRTDP1CYP2A6
SCHEMBL29368277 0.79 CYP3A4 (0.62) CYP3A4MAPK1AHRTDP1CYP2A6
Methane SCHEMBL23466796 0.75 CYP3A4 (0.59) CYP3A4MAPK1AHRTDP1CYP2A6
SCHEMBL21527928 0.75 CYP3A4 (0.35) CYP3A4MAPK1AHRCYP2A6CES1
SCHEMBL237637 0.75 CYP3A4 (0.35) CYP3A4MAPK1AHRCYP2A6CES1
SCHEMBL8667614 0.75 CYP3A4 (0.35) CYP3A4MAPK1AHRCYP2A6CES1
SCHEMBL447139 0.73
SCHEMBL17552676 0.71 CYP3A4 (0.41) CYP3A4MAPK1AHRTDP1CYP2A6
SCHEMBL8667589 0.71 CYP3A4 (0.32) CYP3A4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 749 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250377336-A1 COATING INNER SURFACES OF ENCLOSED ARTICLES UNIV TASMANIA (AU) 2025-12-11 US claimed
WO-2025122450-A1 PHOTOCAGED METAL/METALLOID-ALKOXY AND SILOXANE POLYMER BUILDING BLOCKS AND APPLICATIONS THEREOF BOWLING GREEN STATE UNIVERSITY (US) 2025-06-12 WO claimed
CN-119775566-B Cyano resin containing cage-shaped silsesquioxane structure and preparation method thereof 西华大学 2025-05-13 CN claimed
CN-118514403-B Preparation method of antibacterial high-wear-resistance BOPP printing film 浙江凯诚新材料有限公司 2025-04-18 CN claimed
WO-2025081149-A1 ELECTROCHEMICALLY ACTIVE-MATERIAL STRUCTURES COMPRISING SILICON AND INERT ELEMENTS AND METHODS OF FABRICATING THEREOF GRU Energy Lab Inc. (US) 2025-04-17 WO claimed
US-20250122084-A1 Electrochemically Active-Material Structures Comprising Silicon and Inert Elements and Methods of Fabricating Thereof CLYRA INC. 2025-04-17 US claimed
CN-119775566-A Cyano resin containing cage-shaped silsesquioxane structure and preparation method thereof 西华大学 2025-04-08 CN claimed
CN-117865556-B Environment-friendly asphalt material and preparation method thereof 湖州市交通绿色环保新材料有限公司 2024-12-17 CN claimed
CN-114540609-B Inclined bottom heating process based on heat recovery 湖州中合鑫顺特钢股份有限公司 2024-05-03 CN claimed
WO-2024080179-A1 SILOXANE RESIN, SILOXANE RESIN COMPOSITION, CURED PRODUCT OF SILOXANE RESIN COMPOSITION, VARNISH 本州化学工業株式会社 2024-04-18 WO claimed
WO-2001077204-A1 POLYCARBONATE PREPARATION PROCESS DOW GLOBAL TECHNOLOGIES INC. (US) 2001-10-18 WO claimed
US-6225436-B1 REACTING PHOSGENE AND DIHYDRIC PHENOL; ADDING ACYL HALIDE; ADDING A CHAIN TERMINATOR TO THE REACTION MIXTURE; COMPLETING POLYMERIZATION REACTION THE DOW CHEMICAL COMPANY 2001-05-01 US claimed
US-6225191-B1 THE CLEANING OPERATION IS PERFORMED IN SITU AFTER THE WAFER IS DICED AND WHILE THE DICED CHIPS ARE STILL AFFIXED TO THE TAPE CARRIER. LUCENT TECHNOLOGIES INC. 2001-05-01 US claimed
US-5641541-A Process to apply photoresist printer to a wafer TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) 1997-06-24 US claimed
CN-1010319-B Curable synthetic resin coating and preparation method thereof PHILIPS NV (NL) 1990-11-07 CN claimed
US-4906676-A Resin composition containing fine silica particles therein MITSUBISHI RAYON CO., LTD. (JP) 1990-03-06 US claimed
CN-85101534-A The method of curable synthetic resin composition and manufacturing multipolymer 1987-01-17 CN claimed
US-4481366-A Process for the preparation of a trifluorovinylsilane, and fluorine-containing polymer and process for its preparation SAGAMI CHEMICAL RESEARCH CENTER (JP) 1984-11-06 US claimed
EP-0119404-A1 Fluorine-containing polymer and process for its preparation SAGAMI CHEMICAL RESEARCH CENTER (JP) 1984-09-26 EP claimed
US-4075367-A SEMICONDUCTOR PROCESSING OF SILICON NITRIDE NCR CORPORATION (US) 1978-02-21 US claimed