SCHEMBL3880459

SCHEMBL3880459

CC12CCC(C(S(=O)(=O)[O-])C1=O)C2(C)C.O=C(C[S+]1CCCC1)c1cccc2ccccc12

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CBX7 O95931 2/20 0.33
CDY1; CDY1B Q9Y6F8 2/20 0.33
PTPN1 P18031 1/20 0.33
KMT2A Q03164 4/20 0.32
MEN1 O00255 3/20 0.32
ALDH1A1 P00352 3/20 0.32
KDM4E B2RXH2 2/20 0.32
GMNN O75496 2/20 0.32
LMNA P02545 2/20 0.32
POLB P06746 2/20 0.32
MAPT P10636 2/20 0.32
HPGD P15428 2/20 0.32
MAPK1 P28482 2/20 0.32
BLM P54132 2/20 0.32
PMP22 Q01453 2/20 0.32
NPSR1 Q6W5P4 2/20 0.32
CMKLR1 Q99788 2/20 0.32
TDP1 Q9NUW8 2/20 0.32
TP53 P04637 1/20 0.32
CYP1A2 P05177 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6723001 0.80 DPP4 (0.32) ALDH1A1HSD17B10SMN1; SMN2
SCHEMBL6731585 0.79 DPP4 (0.32)
SCHEMBL6723354 0.78 DPP4 (0.31)
SCHEMBL6723341 0.77 DPP4 (0.30) CNR2
SCHEMBL6735635 0.77 DPP4 (0.31)
SCHEMBL6728912 0.77 DPP4 (0.31)
SCHEMBL6723070 0.77 DPP4 (0.31)
SCHEMBL3880461 0.77 CYP1A2 (0.46) KMT2AMEN1ALDH1A1KDM4ECYP1A2
SCHEMBL6734653 0.76 DPP4 (0.31)
SCHEMBL6726220 0.76 DPP4 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed