SCHEMBL3880897

SCHEMBL3880897

CC(OC(=O)C1CC2C=CC1C2)(C12CC3CC(CC(C3)C1)C2)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.40
LMNA P02545 1/20 0.40
EPHX2 P34913 2/20 0.39
ALDH1A1 P00352 7/20 0.37
HPGD P15428 1/20 0.35
KMT2A Q03164 3/20 0.34
POLB P06746 3/20 0.34
RAB9A P51151 1/20 0.34
APEX1 P27695 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
ESR2 Q92731 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
CYP17A1 P05093 1/20 0.32
CYP19A1 P11511 1/20 0.32
THRB P10828 1/20 0.31
MAPK1 P28482 2/20 0.31
MEN1 O00255 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL525611 0.89 KDM4E (0.40) KDM4ELMNAEPHX2ALDH1A1HPGD
SCHEMBL5025382 0.84 KDM4E (0.36) KDM4ELMNAEPHX2ALDH1A1HPGD
SCHEMBL22263962 0.83 KDM4E (0.35) KDM4ELMNAEPHX2ALDH1A1HPGD
SCHEMBL5025320 0.83 KDM4E (0.37) KDM4ELMNAEPHX2ALDH1A1HPGD
SCHEMBL30210124 0.80 KDM4E (0.37) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL22263722 0.79 ALDH1A1 (0.43) KDM4ELMNAEPHX2ALDH1A1HPGD
SCHEMBL525537 0.79 KDM4E (0.49) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL14534917 0.79 KDM4E (0.49) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL14628488 0.79 KDM4E (0.49) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL30862606 0.79 KDM4E (0.49) KDM4ELMNAALDH1A1HPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed