SCHEMBL3882017

SCHEMBL3882017

C=Cc1cc[nH]c(=O)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1753475 0.79
SCHEMBL9158935 0.77
Hydrochloric Acid SCHEMBL28103981 0.77 CYP2A6 (0.48)
SCHEMBL2881701 0.72 NOTUM (0.52)
SCHEMBL2881704 0.72 NOTUM (0.52)
SCHEMBL4268002 0.72 IDH1 (0.40)
SCHEMBL1002245 0.70 IP6K1 (0.53)
SCHEMBL2881273 0.70 AHR (0.53)
SCHEMBL7430325 0.70 ENPP2 (0.41)
SCHEMBL1521838 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4710377-A1 REINFORCED ION EXCHANGE MEMBRANES MANN+HUMMEL LIFE SCIENCES & ENVIRONMENT HOLDING SINGAPORE PTE. LTD. (SG) 2026-03-18 EP claimed
WO-2024236390-A1 REINFORCED ION EXCHANGE MEMBRANES MANN+HUMMEL LIFE SCIENCES & ENVIRONMENT HOLDING SINGAPORE PTE. LTD. (SG) 2024-11-21 WO claimed
EP-4462526-A1 REINFORCED ION EXCHANGE MEMBRANES MANN+HUMMEL LIFE SCIENCES & ENVIRONMENT HOLDING SINGAPORE PTE. LTD. (SG) 2024-11-13 EP claimed
US-20030206846-A1 Fluorine removal by ion exchange EDWARDS VACUUM, INC. 2003-11-06 US claimed
EP-4462526-A1 REINFORCED ION EXCHANGE MEMBRANES MANN+HUMMEL LIFE SCIENCES & ENVIRONMENT HOLDING SINGAPORE PTE. LTD. (SG) 2024-11-13 EP disclosed
CN-114920471-A Production process of fluidized lime 湖州浙宝钙业科技股份有限公司 2022-08-19 CN disclosed
EP-3002283-B1 THIAZOLE DERIVATIVES KYOWA HAKKO KIRIN CO LTD (JP) 2017-06-14 EP disclosed
EP-1298495-B1 Method of developing photosensitive planographic printing plate FUJIFILM CORP (JP) 2009-01-14 EP disclosed
US-6946239-B2 Development is accelerated by brushing the immersed photosensitive planographic printing plate with a brush produced by winding, around a a rotating roller, a brushing band composed of a sheet of a woven hairy material FUJI PHOTO FILM CO., LTD. (JP) 2005-09-20 US disclosed
US-20030104317-A1 Development is accelerated by brushing the immersed photosensitive planographic printing plate with a brush produced by winding, around a a rotating roller, a brushing band composed of a sheet of a woven hairy material FUJI PHOTO FILM CO., LTD. 2003-06-05 US disclosed
EP-1298495-A1 Method of developing photosensitive planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-04-02 EP disclosed