Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 13/20 | 0.52 |
| ▸ | EP300 | Q09472 | 4/20 | 0.42 |
| ▸ | KAT2B | Q92831 | 3/20 | 0.42 |
| ▸ | KAT8 | Q9H7Z6 | 3/20 | 0.42 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.42 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.42 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.39 |
| ▸ | PIM1 | P11309 | 1/20 | 0.39 |
| ▸ | LTK | P29376 | 1/20 | 0.39 |
| ▸ | LIMK1 | P53667 | 1/20 | 0.39 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.39 |
| ▸ | LDHA | P00338 | 1/20 | 0.37 |
| ▸ | CTSB | P07858 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL2516940 | 0.83 | MEN1 (0.39) | IDO1EP300KAT2BKAT8LDHA | |
| SCHEMBL12762160 | 0.82 | IDO1 (0.45) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL701579 | 0.78 | CYP1A2 (0.54) | — | |
| SCHEMBL3122221 | 0.77 | PSD (0.34) | IDO1EP300KAT2BKAT8LDHA | |
| SCHEMBL12748736 | 0.77 | IDO1 (0.59) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL29420748 | 0.77 | IDO1 (0.59) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL132348 | 0.77 | IDO1 (0.59) | IDO1EP300KAT2BKAT8HDAC3 | |
| Hydrochloric Acid SCHEMBL4410534 | 0.75 | IDO1 (0.56) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL29638 | 0.72 | IDO1 (1.00) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL32677325 | 0.72 | IDO1 (1.00) | IDO1EP300KAT2BKAT8HDAC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20080187859-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| US-20070269735-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-7297461-B2 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-11-20 | — | — | US | disclosed |
| US-7288359-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-10-30 | — | — | US | disclosed |
| EP-1736829-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-1726608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-11-29 | — | — | EP | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-7108955-B2 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20040143082-A1 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030170561-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |