Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 10/20 | 0.59 |
| ▸ | EP300 | Q09472 | 3/20 | 0.46 |
| ▸ | KAT2B | Q92831 | 3/20 | 0.46 |
| ▸ | KAT8 | Q9H7Z6 | 3/20 | 0.46 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.46 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.46 |
| ▸ | LDHA | P00338 | 1/20 | 0.45 |
| ▸ | CTSB | P07858 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | APP | P05067 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | CASP1 | P29466 | 1/20 | 0.39 |
| ▸ | SNCA | P37840 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29420748 | 1.00 | IDO1 (0.59) | IDO1EP300KAT2BKAT8HDAC3 | |
| Hydrochloric Acid SCHEMBL4410534 | 0.98 | IDO1 (0.56) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL1130216 | 0.92 | IDO1 (0.50) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL12748736 | 0.86 | IDO1 (0.59) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL1130786 | 0.86 | IDO1 (0.43) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL1130788 | 0.83 | IDO1 (0.41) | IDO1EP300KAT2BKAT8HDAC3 | |
| Trifluoroacetic Acid SCHEMBL1130145 | 0.83 | IDO1 (0.41) | IDO1EP300KAT2BKAT8HDAC3 | |
| Trifluoromethanesulfonic Acid SCHEMBL36124 | 0.82 | LDHA (0.44) | IDO1EP300KAT2BKAT8LDHA | |
| Trifluoromethanesulfonic Acid SCHEMBL31168271 | 0.82 | LDHA (0.44) | IDO1EP300KAT2BKAT8LDHA | |
| SCHEMBL1130239 | 0.79 | EP300 (0.51) | IDO1EP300KAT2BKAT8LDHA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 582 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7682770-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-23 | — | — | US | claimed |
| US-20250213434-A1 | DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY | KURARAY NORITAKE DENTAL INC. (JP) | 2025-07-03 | — | — | US | disclosed |
| EP-4505992-A1 | DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY | Kuraray Noritake Dental Inc. (JP) | 2025-02-12 | — | — | EP | disclosed |
| CN-119317999-A | Method for processing component | 日东电工株式会社 | 2025-01-14 | — | — | CN | disclosed |
| CN-119301209-A | Transfer sheet | 日东电工株式会社 | 2025-01-10 | — | — | CN | disclosed |
| CN-118946340-A | Curable composition for dentistry having excellent color tone adaptability | 可乐丽则武齿科株式会社 | 2024-11-12 | — | — | CN | disclosed |
| EP-4091578-B1 | METHOD FOR PRODUCING PLATE DENTURE | TOKUYAMA DENTAL CORP (JP) | 2024-10-09 | — | — | EP | disclosed |
| WO-2024075641-A1 | POLYMER MATERIAL FOR USE IN DENTISTRY | サンメディカル株式会社 | 2024-04-11 | — | — | WO | disclosed |
| US-11857385-B2 | Method of producing plate denture, curable composition for stereolithography, and plate denture production kit | TOKUYAMA DENTAL CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| WO-2023243636-A1 | MEMBER PROCESSING METHOD | 日東電工株式会社 | 2023-12-21 | — | — | WO | disclosed |
| EP-1422254-A2 | Photocationic polymerization initiator and photocationically polymerizable composition | Tokuyama Corporation (JP) | 2004-05-26 | — | — | EP | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20040009427-A1 | Negative resist composition | TOKYO OHKA KOGYO CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030170561-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| US-20030008233-A1 | Negative-working photoresist composition | HADA HIDEO (JP) | 2003-01-09 | — | — | US | disclosed |
| US-6444397-B2 | AMPLIFICATION; PHOTOLITHOGRAPHY PATTERNING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-09-03 | — | — | US | disclosed |
| US-20010049073-A1 | Negative-working photoresist composition | HADA HIDEO (JP) | 2001-12-06 | — | — | US | disclosed |
| EP-1128212-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-29 | — | — | EP | disclosed |