⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Lithium SCHEMBL30139354 | 0.82 | — | — | |
| SCHEMBL29064920 | 0.82 | — | — | |
| SCHEMBL20003411 | 0.82 | — | — | |
| SCHEMBL8385727 | 0.82 | — | — | |
| SCHEMBL2888184 | 0.82 | — | — | |
| SCHEMBL8729828 | 0.82 | — | — | |
| SCHEMBL17686491 | 0.82 | — | — | |
| SCHEMBL907417 | 0.82 | — | — | |
| SCHEMBL21633776 | 0.82 | — | — | |
| SCHEMBL936745 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 947 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114256444-B | Phosphorus-nickel-germanium composite anode material, preparation method and application thereof | 公元股份有限公司 | 2024-11-15 | — | — | CN | claimed |
| EP-3320562-B1 | FORMULATIONS TO SELECTIVELY ETCH SILICON GERMANIUM RELATIVE TO GERMANIUM | ENTEGRIS INC (US) | 2024-08-28 | — | — | EP | claimed |
| CN-117687600-A | True random number generator based on nickel-germanium Schottky junction and implementation method thereof | 浙江大学 | 2024-03-12 | — | — | CN | claimed |
| CN-114990570-B | Preparation method of nickel-germanium serpentine composite material and application of nickel-germanium serpentine composite material in electrocatalysis | 广西晶联光电材料有限责任公司 | 2024-01-02 | — | — | CN | claimed |
| US-11777016-B2 | Method of forming backside power rails | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-10-03 | — | — | US | claimed |
| CN-109841498-B | Semiconductor device and method for manufacturing the same | 爱思开海力士有限公司 | 2023-09-19 | — | — | CN | claimed |
| CN-116031265-B | Photodetector integrated with solar cell and CMOS circuit and manufacturing method | 上海铭锟半导体有限公司 | 2023-09-15 | — | — | CN | claimed |
| CN-116313757-A | Method for doping shallow junction with medium-high N type germanium and application thereof | 厦门理工学院 | 2023-06-23 | — | — | CN | claimed |
| CN-116031265-A | Photodetector integrated with solar cell and CMOS circuit and manufacturing method | 上海铭锟半导体有限公司 | 2023-04-28 | — | — | CN | claimed |
| US-20220336641-A1 | Method of Forming Backside Power Rails | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-10-20 | — | — | US | claimed |
| US-20080311747-A1 | METAL-GERMANIUM PHYSICAL VAPOR DEPOSITION FOR SEMICONDUCTOR DEVICE DEFECT REDUCTION | TEXAS INSTRUMENTS INCORPORATED (US) | 2008-12-18 | — | — | US | claimed |
| US-7435672-B2 | Metal-germanium physical vapor deposition for semiconductor device defect reduction | TEXAS INSTRUMENTS INCORPORATED (US) | 2008-10-14 | — | — | US | claimed |
| US-20070187767-A1 | SEMICONDUCTOR DEVICE INCLUDING MISFET | KABUSHIKI KAISHA TOSHIBA | 2007-08-16 | — | — | US | claimed |
| EP-1429884-B1 | IMPROVED COMPOSITIONS, METHODS AND DEVICES FOR HIGH TEMPERATURE LEAD-FREE SOLDER | HONEYWELL INT INC (US) | 2006-06-21 | — | — | EP | claimed |
| US-20060024963-A1 | Metal-germanium physical vapor deposition for semiconductor device defect reduction | TEXAS INSTRUMENTS INCORPORATED (US) | 2006-02-02 | — | — | US | claimed |
| US-20040178476-A1 | Etching metal using sonication | BRASK JUSTIN K (US) | 2004-09-16 | — | — | US | claimed |
| US-6746967-B2 | Etching metal using sonication | INTEL CORPORATION | 2004-06-08 | — | — | US | claimed |
| US-20040061199-A1 | Etching metal using sonication | INTEL CORPORATION | 2004-04-01 | — | — | US | claimed |
| US-4619696-A | Additive for metallurgical liquids, and method and device for the preparation thereof | O.E.T. - METALCONSULT S.R.L. (IT) | 1986-10-28 | — | — | US | claimed |
| EP-0146830-A2 | Additive for metallurgical liquids, and method and device for the preparation thereof | O.E.T.-METALCONSULT S.r.l. (IT) | 1985-07-03 | — | — | EP | claimed |