SCHEMBL388924

SCHEMBL388924

COC(C)CCC=C(C)C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.38
CYP2C19 P33261 1/20 0.38
ALOX15 P16050 3/20 0.36
CD81 P60033 2/20 0.34
ACLY P53396 1/20 0.33
ACACA Q13085 1/20 0.33
ALDH1A1 P00352 2/20 0.33
TSHR P16473 1/20 0.32
PPARG P37231 1/20 0.31
FAAH O00519 1/20 0.30
KDM1A O60341 1/20 0.30
MEN1 O00255 1/20 0.30
PLA2G1B P04054 1/20 0.30
MAPT P10636 1/20 0.30
DNMT1 P26358 1/20 0.30
BLM P54132 1/20 0.30
KMT2A Q03164 1/20 0.30
ATG4B Q9Y4P1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL619840 1.00 CYP2D6 (0.38) CYP2D6CYP2C19ALOX15CD81ACLY
SCHEMBL553718 0.83 CYP2D6 (0.37) CYP2D6CYP2C19ALOX15ALDH1A1TSHR
SCHEMBL553720 0.83 CYP2D6 (0.37) CYP2D6CYP2C19ALOX15ALDH1A1TSHR
SCHEMBL3934005 0.82 CYP2D6 (0.39) CYP2D6CYP2C19ALOX15CD81ACLY
SCHEMBL3934007 0.82 CYP2D6 (0.39) CYP2D6CYP2C19ALOX15CD81ACLY
SCHEMBL14151457 0.81 CYP2D6 (0.36) CYP2D6CYP2C19ALOX15CD81ACLY
SCHEMBL11341491 0.81 CYP2D6 (0.41) CYP2D6CYP2C19ALOX15CD81ACLY
SCHEMBL2115176 0.80 ALOX15 (0.33) CYP2D6CYP2C19ALOX15CD81ACLY
SCHEMBL828377 0.80 APEX1 (0.31)
SCHEMBL3429210 0.80 APEX1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 650 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3847220-B1 UV-CURABLE HOT MELT ADHESIVE COMPOSITIONS FOR FLOORING APPLICATIONS BASF SE (DE) 2025-03-05 EP claimed
EP-3204444-B1 PHOSPHATE ESTER-MODIFIED ACRYLIC POLYOLS BASF SE (DE) 2023-08-30 EP claimed
US-11597139-B2 Solid freeform fabrication object, method of manufacturing solid freeform fabrication object, liquid set for solid freeform fabrication, and device for manufacturing solid freeform fabrication object RICOH COMPANY, LTD. (JP) 2023-03-07 US claimed
US-11076839-B2 Ultrasonic inspection phantom and method of manufacturing same RICOH COMPANY, LTD. (JP) 2021-08-03 US claimed
US-9725528-B2 Process of controlled radical polymerization of branched polyacrylates Henkel IP & Holding GmbH (DE) 2017-08-08 US claimed
EP-2935348-A1 PROCESS OF CONTROLLED RADICAL POLYMERIZATION OF BRANCHED POLYACRYLATES Henkel IP & Holding GmbH (DE) 2015-10-28 EP claimed
US-20150274851-A1 PROCESS OF CONTROLLED RADICAL POLYMERIZATION OF BRANCHED POLYACRYLATES HENKEL CORPORATION 2015-10-01 US claimed
US-20150225626-A1 ADHESIVE COMPOSITIONS HENKEL AG & CO. KGAA (DE) 2015-08-13 US claimed
US-8883941-B2 Methods and apparatus for controlled single electron transfer living radical polymerization HENKEL CORPORATION (US) 2014-11-11 US claimed
US-8822132-B2 Colored dispersion, photoresist composition and black matrix LG CHEM, LTD. (KR) 2014-09-02 US claimed
US-20090284698-A1 Ink composition, color filter manufactured by using the same, and display device comprising the same LG CHEM., LTD. (KR) 2009-11-19 US claimed
WO-2009061159-A2 COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX LG CHEM. LTD. (KR) 2009-05-14 WO claimed
WO-2008127036-A2 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2008-10-23 WO claimed
WO-2008102990-A1 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX LG CHEM, LTD. (KR) 2008-08-28 WO claimed
WO-2008078953-A1 BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME LG CHEM, LTD. (KR) 2008-07-03 WO claimed
US-20080004402-A1 Polymeric product for film formation BORBELY JANOS 2008-01-03 US claimed
US-7208544-B2 Quality finishes without ruptures and/or craters; acryl base copolymer containing trimethylsilyl groups; small amount KUSUMOTO CHEMICALS, LTD. (JP) 2007-04-24 US claimed
EP-1529787-B1 Rosin-fatty acid ester vinylic polymers MEADWESTVACO CORP (US) 2006-03-15 EP claimed
EP-1215221-B1 Rosin-fatty acid vinylic emulsion compositions MEADWESTVACO CORP (US) 2004-08-11 EP claimed
EP-0994123-B1 Rosin-fatty acid vinylic polymer compositions WESTVACO CORP (US) 2004-06-30 EP claimed