Acrylic Acid

Acrylic Acid

SCHEMBL3890155

C=CC(=O)[O-].C=CC(=O)[O-].C=CC(=O)[O-].C=CC(=O)[O-].C=CC(=O)[O-].C=CC(=O)[O-].C=CC(=O)[O-].[La+3].[Mn+2].[Sr+2]

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ATP4AATP4B

The experimentally established mechanism targets of Acrylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.41
ALDH1A1 P00352 4/20 0.39
TSHR P16473 3/20 0.39
FGFR4 P22455 1/20 0.39
CA1 P00915 1/20 0.32
CA9 Q16790 1/20 0.32
BBOX1 O75936 1/20 0.31
MAPK1 P28482 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL2037264 0.93 LMNA (0.47) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL819698 0.93 LMNA (0.47) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL1022750 0.93 LMNA (0.47) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL4253510 0.89 LMNA (0.44) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL4257037 0.89 LMNA (0.44) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL29498110 0.89 LMNA (0.44) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL4254722 0.89 LMNA (0.44) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL4249773 0.89 LMNA (0.44) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL4268429 0.89 LMNA (0.44) LMNAALDH1A1TSHRFGFR4CA1
Acrylic Acid SCHEMBL29516833 0.89 LMNA (0.50) LMNAALDH1A1TSHRFGFR4CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7598022-B2 Positive and negative dual function magnetic resist lithography NATIONAL TAIWAN UNIVERSITY (TW) 2009-10-06 US disclosed
US-20080020325-A1 Positive and negative dual function magnetic resist lithography NATIONAL TAIWAN UNIVERSITY (TW) 2008-01-24 US disclosed