⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3891219 | 0.82 | — | — | |
| SCHEMBL3896453 | 0.80 | — | — | |
| SCHEMBL3898128 | 0.77 | — | — | |
| SCHEMBL20162406 | 0.74 | — | — | |
| SCHEMBL3893270 | 0.69 | — | — | |
| SCHEMBL19409885 | 0.68 | ALDH1A1 (0.36) | — | |
| SCHEMBL15923451 | 0.66 | TDP1 (0.39) | — | |
| Acetic Acid SCHEMBL30413067 | 0.66 | CHRM1 (0.42) | — | |
| SCHEMBL145637 | 0.65 | TDP1 (0.38) | — | |
| SCHEMBL10277718 | 0.65 | TDP1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | claimed |
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7385021-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-10 | — | — | US | disclosed |
| US-20050274692-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050277755-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |