Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.47 |
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | BCHE | P06276 | 5/20 | 0.45 |
| ▸ | EGFR | P00533 | 1/20 | 0.44 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.44 |
| ▸ | ACHE | P22303 | 3/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.43 |
| ▸ | APP | P05067 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29394 | 0.95 | KDM4E (0.53) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| Methacrylic Acid SCHEMBL15376306 | 0.93 | KDM4E (0.44) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| SCHEMBL10941999 | 0.93 | TDP1 (0.48) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| SCHEMBL10940584 | 0.91 | TDP1 (0.47) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| SCHEMBL464928 | 0.91 | TDP1 (0.50) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| Maleic Acid SCHEMBL11028703 | 0.91 | KDM4E (0.50) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| Butadiene SCHEMBL10718191 | 0.91 | KDM4E (0.50) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| SCHEMBL10771896 | 0.90 | TDP1 (0.46) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| SCHEMBL6826960 | 0.90 | KDM4E (0.47) | KDM4ETDP1TSHRL3MBTL1BCHE | |
| Styrene SCHEMBL522764 | 0.90 | KDM4E (0.49) | KDM4ETDP1TSHRL3MBTL1BCHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8101339-B2 | Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| CN-101988922-A | Detecting method and dielectric particle containing magnetic material employed in the detecting method | FUJIFILM CORP | 2011-03-23 | — | — | CN | disclosed |
| US-20090317746-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-12-24 | — | — | US | disclosed |
| CN-1817981-A | Nanometer painting ink-jetting printing oil ink and production thereof | UNIV ZHEJIANG (CN) | 2006-08-16 | — | — | CN | disclosed |
| US-5977228-A | Plasticized aqueous coating compositions | S. C. JOHNSON COMMERCIAL MARKETS, INC. (US) | 1999-11-02 | — | — | US | disclosed |
| US-5225272-A | Comprising a polymeric substrate having an adharent layer; packaging film | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1993-07-06 | — | — | US | disclosed |
| EP-0026932-B1 | AQUEOUS EMULSION COMPRISING THE REACTION PRODUCTS OF A VINYL ACID MONOMER AND A SECOND COPOLYMERISABLE MONOMER | GAF CORPORATION (US) | 1986-01-15 | — | — | EP | disclosed |