SCHEMBL3901525

SCHEMBL3901525

C=CC(=O)OCCCOc1ccc(CCC)cc1

nearest known ligand 0.66

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
THRB P10828 4/20 0.66
TSHR P16473 2/20 0.58
HPGD P15428 1/20 0.58
ALDH1A1 P00352 2/20 0.52
LMNA P02545 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.49
CYP3A4 P08684 1/20 0.46
KDM4E B2RXH2 1/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2D6 P10635 1/20 0.44
PDE4A P27815 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
HIF1A Q16665 1/20 0.44
HDAC10 Q969S8 1/20 0.44
HDAC6 Q9UBN7 1/20 0.44
KMT2A Q03164 2/20 0.44
NPC1 O15118 1/20 0.44
MEN1 O00255 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14597299 0.97 THRB (0.66) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL28574008 0.96 THRB (0.61) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL14117091 0.96 THRB (0.64) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL2153760 0.94 THRB (0.69) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL22451265 0.91 THRB (0.64) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL68699 0.91 THRB (0.68) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL16379446 0.90 THRB (0.61) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL23552995 0.90 THRB (0.64) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL21127912 0.90 THRB (0.64) THRBTSHRHPGDALDH1A1LMNA
SCHEMBL27740010 0.90 THRB (0.59) THRBTSHRHPGDALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101522767-B Hard-coating film, process for producing the same, and antireflection film TORAY INDUSTRIES 2012-08-22 CN claimed
EP-0035574-B1 PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL ARAI, Tokuji (JP) 1985-02-06 EP claimed
EP-0012948-B1 SCRATCH-RESISTANT, DYEABLE COATING COMPOSITIONS FOR SYNTHETIC RESIN ARTICLES MITSUBISHI RAYON CO., LTD. (JP) 1983-02-02 EP claimed
CN-113164328-B Difunctional and multifunctional coinitiators in dental compositions 登士柏德特里有限公司 2024-02-27 CN disclosed
CN-112135598-B Macromer-based photocurable dental impression material 登士柏希罗纳有限公司 2023-12-22 CN disclosed
CN-112839981-B dental composition 登士柏德特里有限公司 2023-11-17 CN disclosed
CN-117042728-A Implant 斯卡勒植入物公司 2023-11-10 CN disclosed
CN-114072122-B Redox curable dental compositions 登士柏德特里有限公司 2023-11-03 CN disclosed
CN-114040939-B Composite particle and method for producing composite particle 凸版印刷株式会社 2023-10-31 CN disclosed
CN-113692269-B Dental composition 登士柏希罗纳有限公司 2023-10-27 CN disclosed
CN-112638348-B Method and composition for stabilizing nanogels and dental compositions produced from nanogels 登士柏希罗纳有限公司 2023-10-24 CN disclosed
CN-1854210-A Microencapsulated particulate metal material, method for producing the same, and aqueous dispersion and ink jet ink using the same SEIKO EPSON CORP (JP) 2006-11-01 CN disclosed
CN-1831056-A Ink composition for ink-jet recording, recording method using the same, and record SEIKO EPSON CORP (JP) 2006-09-13 CN disclosed
CN-1831053-A Ink composition for ink-jet recording, recording method using the same, and record SEIKO EPSON CORP (JP) 2006-09-13 CN disclosed
CN-1592775-A Ink composition for inkjet recording, recording method using the same, and recorded matter SEIKO EPSON CORP (JP) 2005-03-09 CN disclosed
CN-1157439-C Curable resin composition adhesive composition, cured product and composite 电气化学工业株式会社 2004-07-14 CN disclosed
US-5376500-A Storage stability, discoloration inhibition MITSUBISHI RAYON CO., LTD. (JP) 1994-12-27 US disclosed
EP-0035574-B1 PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL ARAI, Tokuji (JP) 1985-02-06 EP disclosed
US-4370403-A BENZIL AND /DIMETHYLAMINO/BENZALDEHYDE PHOTOINITIATORS Arai, Tokuji (JP) 1983-01-25 US disclosed
EP-0035574-A1 PHOTO-POLYMERIZABLE LIGHT-SENSITIVE RESIN COMPOSITION AND LIGHT-SENSITIVE SHEET MATERIAL ARAI, Tokuji (JP) 1981-09-16 EP disclosed