Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX7 | Q99572 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19381628 | 0.86 | P2RX7 (0.42) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL76783 | 0.84 | P2RX7 (0.41) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL1698073 | 0.84 | P2RX7 (0.41) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL32688678 | 0.84 | P2RX7 (0.41) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL5423530 | 0.84 | P2RX7 (0.41) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL12191694 | 0.84 | P2RX7 (0.41) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL9984755 | 0.84 | P2RX7 (0.41) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL9984759 | 0.84 | P2RX7 (0.41) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL11569771 | 0.83 | P2RX7 (0.39) | P2RX7CYP2D6CYP2C19 | |
| SCHEMBL7112807 | 0.82 | P2RX7 (0.40) | P2RX7CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7649118-B2 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. (JP) | 2010-01-19 | — | — | US | disclosed |
| EP-1031879-B1 | Novel ester compounds, polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2009-01-21 | — | — | EP | disclosed |
| US-6284429-B1 | FOR FORMULATING PHOTORESISTS HAVING SENSITIVITY, RESOLUTION, ETCHING RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-04 | — | — | US | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| US-5616780-A | STABILIZERS AGAINST OXIDATION, HEAT OR RADIATION (FOR POLYMERS) | CIBA-GEIGY CORPORATION (US) | 1997-04-01 | — | — | US | disclosed |