⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27722917 | 0.72 | — | — | |
| SCHEMBL1577075 | 0.67 | — | — | |
| SCHEMBL66347 | 0.67 | — | — | |
| SCHEMBL2834719 | 0.67 | — | — | |
| SCHEMBL679513 | 0.64 | — | — | |
| SCHEMBL9865506 | 0.64 | — | — | |
| Nitroethane SCHEMBL1332217 | 0.64 | — | — | |
| SCHEMBL9841058 | 0.64 | — | — | |
| SCHEMBL136652 | 0.61 | — | — | |
| SCHEMBL31709992 | 0.61 | MEN1 (0.86) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7498270-B2 | Method of forming a silicon oxynitride film with tensile stress | TOKYO ELECTRON LIMITED (JP) | 2009-03-03 | — | — | US | disclosed |
| WO-2007040749-A2 | A METHOD OF FORMING A SILICON OXYNITRIDE FILM WITH TENSILE STRESS | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | disclosed |
| US-20070077777-A1 | Method of forming a silicon oxynitride film with tensile stress | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |