Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | GAA | P10253 | 2/20 | 0.51 |
| ▸ | PKM | P14618 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 1/20 | 0.51 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.51 |
| ▸ | S100B | P04271 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | SLC16A3 | O15427 | 1/20 | 0.35 |
| ▸ | SLC16A1 | P53985 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | AR | P10275 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 3/20 | 0.33 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.33 |
| ▸ | PTPRO | Q16827 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | GPX4 | P36969 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5554780 | 1.00 | MAPT (0.51) | MAPTGAAPKMHTTMCL1 | |
| SCHEMBL10514028 | 0.89 | GAA (0.48) | MAPTGAAPKMHTTMCL1 | |
| SCHEMBL3906212 | 0.87 | GAA (0.39) | MAPTGAAPKMHTTMCL1 | |
| SCHEMBL5554784 | 0.87 | GAA (0.39) | MAPTGAAPKMHTTMCL1 | |
| SCHEMBL10933951 | 0.86 | MAPT (0.56) | MAPTGAAPKMHTTMCL1 | |
| SCHEMBL9095190 | 0.81 | S1PR1 (0.43) | MAPTGAAS100BSLC16A3SLC16A1 | |
| SCHEMBL81551 | 0.79 | S100B (0.58) | MAPTGAAPKMHTTMCL1 | |
| SCHEMBL15244176 | 0.79 | S100B (0.64) | GAAS100BSLC16A3SLC16A1KDM4E | |
| SCHEMBL19980899 | 0.79 | S100B (0.64) | GAAS100BSLC16A3SLC16A1KDM4E | |
| SCHEMBL13422458 | 0.79 | S100B (0.64) | GAAS100BSLC16A3SLC16A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1765592-B1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2009-01-28 | — | — | EP | disclosed |
| US-20080311524-A1 | Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor | AGFA GRAPHICS N.V. (BE) | 2008-12-18 | — | — | US | disclosed |
| EP-1803034-A2 | HOLOGRAPHIC STORAGE MEDIUM | General Electric Company (US) | 2007-07-04 | — | — | EP | disclosed |
| EP-1765592-A1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | Agfa Graphics N.V. (BE) | 2007-03-28 | — | — | EP | disclosed |
| WO-2006044243-A2 | HOLOGRAPHIC STORAGE MEDIUM | GENERAL ELECTRIC COMPANY A CORPORATION OF THE STATE OF NEW YORK (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060078802-A1 | Holographic storage medium | SABIC INNOVATIVE PLASTICS IP B.V. | 2006-04-13 | — | — | US | disclosed |
| WO-2006005688-A1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR. | AGFA-GEVAERT (BE) | 2006-01-19 | — | — | WO | disclosed |
| EP-1614541-A2 | Method of making a lithographic printing plate. | Agfa-Gevaert (BE) | 2006-01-11 | — | — | EP | disclosed |
| EP-0239868-B1 | PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE | BASF Aktiengesellschaft (DE) | 1989-12-27 | — | — | EP | disclosed |
| US-4857438-A | Photochromic system and layers produced therewith | BASF AKTIENGESELLSCHAFT (DE) | 1989-08-15 | — | — | US | disclosed |
| EP-0188205-B1 | PHOTORESIST COMPOSITIONS WITH ENHANCED SENSITIVITY USING POLYAMIDE ESTERS | CIBA-GEIGY AG (CH) | 1988-06-22 | — | — | EP | disclosed |
| US-4701300-A | Polyamide ester photoresist formulations of enhanced sensitivity | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1987-10-20 | — | — | US | disclosed |
| EP-0239868-A1 | Photochromic system, layer prepared thereof and its use | BASF Aktiengesellschaft (DE) | 1987-10-07 | — | — | EP | disclosed |
| EP-0188205-A2 | Photoresist compositions with enhanced sensitivity using polyamide esters | CIBA-GEIGY AG (CH) | 1986-07-23 | — | — | EP | disclosed |
| US-4332884-A | USING A DIOXIME CHELATING AGENT | RICOH CO., LTD. (JP) | 1982-06-01 | — | — | US | disclosed |
| US-4315068-A | CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS | RICOH CO., LTD. (JP) | 1982-02-09 | — | — | US | disclosed |
| US-4306014-A | AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM | RICOH CO., LTD. (JP) | 1981-12-15 | — | — | US | disclosed |
| US-4251619-A | Process for forming photo-polymeric image | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| US-4139390-A | Presensitized printing plate having a print-out image | EASTMAN KODAK COMPANY (US) | 1979-02-13 | — | — | US | disclosed |